The usefulness and power of fast mismatch analysis options within the network analysis environment are demonstrated. Simulated yield statistics and measurements of a fabricated analog application are reported and compared. The physical connections introduced between local and global process variations lead to new procedures for calculating the overall tolerance ranges of the electrical characteristics. The simulation examples illustrate the comfort of the implementation and provide information regarding interconnections between local mismatch effects and circuit design.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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