摘要: 考虑中性气体在电离层高度的扩散过程和相应的电离层离子化学过程,研究了利用主动化学物质释放来改变电离层的方法,理论计算了H2O和SF6两种气体释放后电离层随时间的响应过程.结果表明,在电离层高度上气体的扩散过程非常迅速,电离层F区的电子密度有很大程度的减少,而扩散慢且化学反应快的气体对电离层的影响更大,就更加有利于电离层洞的形成. 关键词: 化学释放 / 电离层扰动 / 扩散过程
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