GaN HEMTs based on polarization super junction (PSJ) technology offer significant improvements in efficiency and power density over conventional silicon (Si) devices due to their excellent material characteristics, which enable fast switching edges and lower specific on-resistance. However, due to the presence of an uninterrupted channel between drain and source at zero gate bias, these devices have normally-on characteristics. In this paper, the performance of a 1200 V GaN FET utilizing PSJ technology in cascode configuration is reported. The device working principle, characteristics, and switching behavior are experimentally demonstrated. The results show that cascoded GaN FETs utilizing the PSJ concept are highly promising for power device applications.
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