A quality improvement of the III–V dilute nitride semiconductor alloy, GaInNAs, grown by metalorganic chemical vapor deposition (MOCVD) on a GaAs substrate is reported for 1.3 µm-wavelength lasers. GaInNAs wafers were grown at various growth temperatures, V/III ratios, and growth rates. The photoluminescence (PL) efficiency of GaInNAs/GaAs quantum wells (QWs) was increased by lowering the growth temperature and increasing the V/III ratio in the growth conditions conventionally used for nitrogen (N)-free GaInAs/GaAs QW growth. These conditions are important for realizing high PL efficiency because they prevent the inhomogeneity of the immiscible alloy of GaInNAs. It was also observed that the optimal window for the growth temperature, V/III ratio, and growth rate for the GaInNAs is narrower than that of N-free GaInAs QWs. After careful optimization of the growth conditions, GaInNAs/GaAs QW lasers with various emission wavelengths were fabricated. Low-threshold current densities of 0.17 kA/cm2/well, 0.18 kA/cm2/well, and 0.44 kA/cm2/well are obtained for emission wavelengths of 1.25 µm, 1.30 µm, and 1.34 µm, respectively. The results obtained for growth conditions and lasing characteristics are useful in further improving 1.3 µm or longer wavelength GaInNAs lasers grown by MOCVD.
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