In situ spectroscopic ellipsometry in the spectral region of 1.3–4.3 eV has been employed to monitor, in real-time, the formation of trivalent Cr process (TCP) conversion coatings on polished Al substrates. The measured ellipsometry parameters (Ψ and Δ), as a function of immersion time, reveal that the initial stages of film formation include the chemical thinning of the native oxide layer, formation of a very thin initiation layer and the subsequent rapid formation of the TCP film. The film optical constant is modeled using Cauchy dispersion relation and its thickness was determined as a function of immersion time during growth.
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