Full-width At Half-maximum Spot Research Articles

Modeling, optimization, and validation of an extended-depth-of-field optical coherence tomography probe based on a mirror tunnel.

The diagnostic capability of high-resolution optical coherence tomography (OCT) may be enhanced by using extended depth-of-field (EDOF) imaging that retains high transverse resolution over long depths. A recently developed mirror-tunnel optical probe design (single-mode fiber to multimode fiber to lens structure) that generates coaxially focused modes has been previously shown to enable EDOF for endoscopic OCT applications. Here, we present ray-tracing optical modeling of this optical configuration, which has the potential to guide performance improvement through optimization. The Huygens wave propagation of the field was traced through probe components with initial lengths. The irradiance along the x-z plane was analyzed, yielding an average full width at half-maximum (FWHM) of 9 µm over a 640 µm DOF (defined as the axial range over which the beam's transverse FWHM is maintained). A custom merit function was then defined, based on the focal region illumination intensity profile that yielded the maximum possible depth having a constrained FWHM size. An orthogonal gradient descent optimization algorithm was then applied using this merit function, using the multimode fiber, spacer, and lens lengths as variables. Optimization resulted in a modeled mean 6 µm FWHM spot diameter over an EDOF of 1 mm. Following optimization, a probe was fabricated, and was validated using a custom-built near-field scanning pinhole beam profiler. The experimental results (6 µm mean FWHM over 800 µm EDOF) showed reasonable correspondence to the simulated predictions, demonstrating the potential utility of optical modeling and optimization for improving EDOF performance in mirror-tunnel endoscopic OCT probes.

Microlens array fabricated by a low-cost grayscale lithography maskless system

This work presents the fabrication of a contiguous f/#=f/15 Fresnel microlens array (MLA) by employing a low-cost home-built maskless exposure lithographic system based on a digital light projector technology by using Texas Instruments’ digital micromirror device chip. A continuous diffractive phase relief structure was generated on a photoresist-coated silicon wafer, replicated in polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. The whole exposure time takes 10.8 min to expose a 2.4×2.4 mm MLA, with a resolution of 2.5 μm. This exposure time is relatively short, enabling high throughput or fast prototyping. Optical characterization was carried out using a He-Ne laser source (λ=633 nm ), by evaluating the maximum intensity of each spot generated at the MLA focal plane, Imax, as well as its sharpness by measuring their full width at half maximum (FWHM) intensity values. The resulting FWHM and maximum intensity spot average values were FWHM AVG =20±8% μm and Imax AVG =0.71±7% a.u. , respectively. The quality of replication was evaluated by profile characterization of the resulting mold and replica based on step height measurement along 180 μm. The maximum obtained difference was 32 nm, corresponding to 2.5% of the total mold height or λ/20 . AFM measurements were also carried out to quantify the roughness quality between mold and replica. The resulting RMS roughness was 4.73 nm (λ/130 ) and 6.66 nm (λ/95 ) for mold and replica, respectively. A comparison between theoretical and measured intensity profiles at the MLA focal plane was also carried out. A good correspondence between the results was found. Such an MLA can be applied as a Shack–Hartmann wavefront sensor in optical interconnects and to enhance the efficiency of detector arrays.

Microlens Array Fabricated by Gray-Scale Lithography Maskless System

This work presents the fabrication of a high fill factor Fresnel microlens array (MLA) by employing a low-cost home-built maskless exposure lithographic system. A phase relief structure was generated on a photoresist-coated silicon wafer, replicated in Polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. Optical characterization was based on the evaluation of the maximum intensity of each spot generated at the MLA focal plane as well as its full width at half maximum (FWHM) intensity values. The resulting FWHM and maximum intensity spot mean values were 50 ± 8%μm and 0.71 ± 7% a.u , respectively. Such a MLA can be applied as Shack-Hartmann wavefront sensors, in optical interconnects and to enhance the efficiency of detector arrays.

Imaging properties of dielectric photonic crystal slabs for large object distances

We extend the understanding of the imaging properties of dielectric photonic crystal slabs to object distances that are larger than the slab thickness. We specifically consider hexagonal crystal lattices in the second band. For object distances smaller than the slab thickness, the image distance is a negative linear function of the object distance as expected for negative refractive index materials. The effective refractive index extracted from this linear object-image relation is close to the negative unity value calculated for infinite photonic crystal using the plane wave expansion method. In contrast to previous predictions, we find that a real image can still be formed for object distances up to twice the slab thickness. In this regime the image distance changes little as the object distance increases, and can thus be described as the saturated image regime. Sub-wavelength resolution performance can be approximately maintained even for these larger object distances. The full-width half-maximum spot size at the image is approximately (0.43-0.55)lambda up to object distances 1.5 times the slab thickness. By evaluating the image angular frequency spectrum we show that this sub-wavelength resolution imaging at larger object distances is due to evanescent waves that arise within the slab, rather than being directly transferred from the object. The eventual loss of image resolution is due to interference side lobes which enter the image plane.

Design tips of nanoapertures with strong field enhancement and proposal of novel L-shaped aperture

We summarize some design tips and design procedures of nanoapertures with strong field enhancement, based on the theoretical calculations and analyses of near-field distributions of unconventional C apertures and bow-tie apertures by a finite-difference time-domain method. A novel L-shaped aperture is proposed and further validates the proposed design rule. As a result, a 15×15-nm full width half maximum spot forms in the light exit plane of the L aperture. Its intensity maximum enhancement reaches a factor of about 568 and the power throughput is bigger than unity. The mechanisms of electromagnetic field enhancement are preliminarily analyzed. This unconventional nanoaperture is likely to be directly used as an exit aperture of very small aperture lasers, or as an unattached shield, to produce a subwavelength light source with high transmission.

Imaging of optical field confinement in ridge waveguides fabricated on very-small-aperture laser

Optical field confinement in a ridge waveguide nanostructure (“C” aperture) designed for ultrahigh-density recording was observed using an apertureless near-field scanning optical microscope. The aperture was fabricated on a commercial edge-emitting semiconductor laser as the light source. High-contrast near-field images at both 1× and 2× lock-in detection frequencies were obtained. The emission patterns are in agreement with theoretical simulation of such structures. A 90 nm×70 nm full width half maximum spot size was measured and is comparable to the ridge width of the aperture.

Surface nanostructuring of borosilicate glass by femtosecond nJ energy pulses

We report on a feature, that of hillock-shaped damage, formed on a glass surface by femtosecond pulses of tp=180 fs [full width at half maximum (FWHM) value] duration produced by a recording beam focus with energy of 5 nJ/pulse at 800 nm wavelength (the corresponding irradiance of about 7.6 TW/cm2 was evaluated for a 0.68 μm FWHM spot size). Single hillocks of 40–50 nm height were recorded reproducibly in single-pulse irradiation. Surface nanopatterning over a large, curved area (over 200 μm2) can be achieved by implementing a confocal surface curvature tracking method that utilizes the reflection of a supplementary cw-laser beam. The ablation pattern achieved by this method is consistent with that of a Coulomb explosion.

Design and Fabrication of Microlens Array for Near-Field Vertical Cavity Surface Emitting Laser Parallel Optical Head

A GaP microlens for collecting laser light was developed in the tip of a near-field probe. It is important to realize a near-field optical probe head with high throughput and a small spot size. The design and fabrication results of the GaP microlens array are described. The most suitable GaP microlens with a probe was calculated as having a 10 μm radius using the two-dimensional finite difference time domain (2-D FDTD) method. The full width half maximum (FWHM) spot size variation and optical power density tolerance were calculated as 157 nm ± 5 nm and 7%, respectively. A spherical GaP microlens was fabricated with a radius of 10 μm by controlling the Cl2/Ar gas mixture ratio. The difference between the theoretical spherical shape and the fabricated GaP microlens was evaluated as 40 nm at peak to valley. The FWHM spot size and optical throughput of the fabricated microlens were measured as 520 nm and 63%, respectively. The microlens was the same as a theoretical lens with a 10 μm radius. The micron-lens array fabrication process for a near-field optical head was demonstrated in this experiment.