Abstract
Optical field confinement in a ridge waveguide nanostructure (“C” aperture) designed for ultrahigh-density recording was observed using an apertureless near-field scanning optical microscope. The aperture was fabricated on a commercial edge-emitting semiconductor laser as the light source. High-contrast near-field images at both 1× and 2× lock-in detection frequencies were obtained. The emission patterns are in agreement with theoretical simulation of such structures. A 90 nm×70 nm full width half maximum spot size was measured and is comparable to the ridge width of the aperture.
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