Photonic crystals (PCs) are synthetic micro-structures which have periodic refractive indexvariations and produce photonic bandgaps similar to electronic bandgaps produced by thecrystal potentials of semiconductors. Different methods have been proposed anddemonstrated to fabricate two- or three-dimensional photonic crystal structures. Amongthem, the holographic lithography method, in which multi-beam interferenceis employed, offers a number of advantages. These include the ability to createa large volume of uniform periodic structures through an irradiation process,and more degrees of freedom to control the structures. In this study, a model ispresented for predicting the multi-dimensional photonic crystal structures formedusing multi-beam interference. Various parameters, including beam propagationand polarization directions, beam intensities, and phase shifts are considered.Calculations have been carried out to simulate two four-beam configurations whichhave been popularly used in the fabrication of photonic crystals. It has beendemonstrated that the contours of the interference pattern are related to thepolarization states, the intensity ratios among the four beams, and the phasedelays. Therefore, by controlling the beam intensities, polarization directions,and phase delays, different structures can be obtained. The results presented inthis study provide a useful guide for choosing various optical parameters andselecting suitable photoresists to fabricate 2D and 3D photonic crystal structures.