By using first-principles DMol and the discrete-variational method (DVM) based on densityfunctional theory, we investigated the effect of some light impurities, H, B, C, N and O, onthe electronic structure of their corresponding different impurity-doped systems inγ-TiAl. The impurity formation energy, Mulliken occupation, bond order and charge densitydifference have been calculated to study the impurity-induced changes in the energetics andelectronic structure. According to the impurity formation energy, it is found that theimpurities energetically prefer to occupy the Ti-rich octahedron interstitial sites in the orderH<B<O<N<C. Charge transfer suggests that the effect of the impurities is localized and the bond orderas well as charge density difference results show that B, C and N are beneficial for theductility of TiAl, while H and O are not.
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