For well cementing at temperatures above 120 °C, thermal thinning depicts a major problem, promoting particle sedimentation via decreasing slurry viscosities. This is partly caused by dispersing properties of common high temperature retarder systems and can lead to imperfect zonal isolation, endangering the stability of the wellbore. Counteracting additives tend to start losing their effectiveness at temperatures >140 °C. Other options are often not economically sufficient, increase system complexity or show negative interactions with other additives.Hence, this work presents a comprehensive study on the sodium ethylenediamine tetra(methylene phosphonate) (Na-EDTMP)/borax retarder system, which was found to combine sufficient retardation with low thermal thinning, leading to an enhanced slurry stability at high temperatures. Thickening times (TT's) from 7 to 13 h (increasing with temperature) were achieved from atmospheric pressure and 50 °C up to high pressures and temperatures (HP/HT) of 19.0 kpsi and 200 °C bottom hole circulating temperature (BHCT). Furthermore, On/off-cycle HP/HT consistometer tests at 160 and 190 °C and rheological measurements were performed to examine stability of the slurry's viscosity. Experiments with fluid-loss additives show potential compatibility with other additives.Total retarder dosages of 0.97–2.64 % bwoc (by weight of cement) were applied. Compared to prior literature, higher Na-EDTMP/borax ratios (0.29–0.34 vs. 0.055) were found to improve retarding performance probably by enhancing synergetic effects. The slurries featured a sufficient initial viscosity (<40 Bc) and a constant pumpability (10–25 Bc) during the tests followed by a swift setting and compressive strength (CS) development. Additionally, high slurry stability was shown and compatibility with common fluid-loss additives is probable. Main disadvantage was the relatively high sensitivity of the system, especially at moderate temperatures, requiring exact dosage.Summarizing, the Na-EDTMP/borax retarder system might present a low-complexity opportunity for common high temperature retarders, avoiding thermal thinning while improving slurry stability.
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