Materials with resistance-switching properties are proving to be promising for the novel non-volatile memories-resistive random-access memory (ReRAM). Despite extensive research on electric field-induced resistance switching, there are diverse opinions about its reliability and working mechanism. In this work, we analysed the impact of SET and RESET voltages on the switching characteristics and the possible current conduction mechanism of W/TiO2/ITO devices. By simple solution processing and spin coating, titanium dioxide thin films were grown on ITO, glass, silicon, and quartz substrates. The precursor and solvent used for the synthesis of the active layer were titanium isopropoxide and ethanol, respectively. Polycrystalline films with an anatase structure were formed after annealing at 400 °C with a 20 nm average crystallite size, as evidenced by X-ray diffraction patterns. The crystalline nature of the fabricated film has been found to improve on annealing. Using Raman spectroscopy, the chemical bonding states of the film were studied. A UV–visible spectrometer study confirms that anatase TiO2 possesses an indirect band gap transition with a 3.42 eV band gap. The device shows reversible, reproducible, stable, and bipolar resistance-switching behaviour as indicated by current–voltage (I-V) measurements, and it was found that there exists a minimum voltage (∼-4 V) to set the device into an ON state. Compared to crystalline TiO2, theamorphous active layer offers much better switching characteristics, such as good cyclic endurance with a Roff-Ronratio ∼ 10.The current–voltage characteristics were fitted to various carrier transport mechanismssuch as Ohmic conduction, Schottky emission (SE), Space-charge-limited conduction (SCLC), and Poole-Frenkel emission (PF). Among these, the ohmic and SE mechanisms were detected at low and high fields, respectively. Schottky barrier modulation at the metal-oxide interface has been identified as the motive for switching.