Diamond films with different grain sizes are deposited on TiO2 nanotube (TNT) arrays prepared by anodic oxidation using a microwave plasma chemical vapor deposition reactor. The scanning electron microscope, X‐Ray diffractometer, and Raman results indicate that the diamond film is successfully deposited and that the substrate undergoes a phase transition due to the diamond deposition temperature, resulting in the rutile phase becoming dominant with lower energy bandgap and work function. Notably, after 5 h of deposition, a relatively continuous microcrystalline film is formed on the TNTs, and the diamond grains change from spherical to pyramidal and show excellent electron field emission behavior, with a low turn‐on field of 0.5 V μm−1 and a current density of 85.9 μA cm−2. In addition, the deposition environment of the nanocrystalline diamond has a large impact on the substrate morphology, resulting in a blocked electron transport path, which reduces the overall field emission performance. The enhanced performance is attributed to the synergistic effect between the highly efficient 1D electron path of the TNTs, the negative electron affinity of the diamond surface, and the lower work function of rutile TiO2.
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