Abstract In this report a comprehensive review of the variations in threshold voltage (VTH) resulting from diverse VTH measurement bias conditions employed by leading manufacturers, as well as VTH extraction techniques is made. Notably, a standard deviation of 15% is observed in threshold voltage values due to variations in measurement bias conditions. This variation is attributed to the change in the lateral electic field conditions across gate and drain which occurs due to the change in bias conditions. Additionally, a simplified physical interpretation of the gate stack in p-GaN gate normally-off AlGaN/GaN on Si HEMTs is made. The formation of the two-dimensional electron gas (2DEG), the charge balance within the pGaN/AlGaN/GaN gate stack, and an analytical expression for threshold voltage are examined. Furthermore, various trapping mechanisms within the gate stack are reviewed to comprehend the dynamic conditions potentially contributing to threshold voltage instability during nominal operation.
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