Laser produced plasma extreme ultraviolet light source, as the exposure light source for next-generation lithography, faces urgent challenges due to its low conversion efficiency and significant debris contamination. Using a triple Langmuir probe, we conducted a study on the parameters and kinetic characteristics of tin droplet-based laser produced plasma that serves as extreme ultraviolet light source. In this paper, we report a design of triple Langmuir probe circuit based on the BWL (Bulk Wirewound Low-value) sampling resistor, which ensures that high-frequency signals remain undistorted during acquisition. Utilizing the “shadowgraph” method, we calculated the average deflection angles of droplet debris jets under different alignment conditions. Combining the diagnostic results from the probe, we found that the alignment accuracy between the laser and droplet directly influences the parameters of plasma. The parameters and kinetic characteristics of plasma were also diagnosed and analyzed at different angles and distances by moving the probe. Employing the triple Langmuir probe, measurements and analyses of laser produced plasma parameters and kinetic characteristics were achieved, providing a convenient method for diagnosing extreme ultraviolet lithography light sources. This work also offers an effective basis for optimizing the light sources.
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