The dynamics of excited carriers generated near a silicon surface were characterized on femtosecond time scales using the transient grating technique in the reflection configuration. For electrons in the energy range $1.4\ifmmode\pm\else\textpm\fi{}0.6\mathrm{eV}$ above the conduction band edge and their corresponding holes, the lifetime for relaxation through phonon scattering at carrier densities below ${10}^{20}\phantom{\rule{0ex}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$ was determined to be 240 fs. This relaxation time increased sharply for carrier densities higher than $5\ifmmode\times\else\texttimes\fi{}{10}^{20}\phantom{\rule{0ex}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$, providing the first direct evidence for charge screening of carrier-phonon scattering in Si.