Eight-transistor Static Random Access Memory Research Articles

A CNTFET Based Bit-Line Powered Stable SRAM Design for Low Power Applications

Higher charge mobility, gate control, and better electrostatics are the key reasons that make carbon nanotube field effect transistor (CNTFET) a better candidate to become the successor of conventional CMOS transistors. However, the increased charge mobility also enhances the leakage power. This work uses CNTFET for designing a low-power eight-transistor static random access memory (8T SRAM) cell. The leakage power of the proposed cell is reduced by 2.21×compared to conventional 6T SRAM at 0.3V with similar CNTFET parameters. The read and write power delay product of the proposed design is improved by 1.02×and 1.85×, respectively. Moreover, the read/ write/ hold static noise margin of the proposed cell is also enhanced by 1.98×/ 0.99×/ 1.01×, respectively, compared to the conventional 6T design. The proposed cell is also compared with three already proposed CNTFET based 8T SRAM designs. Cadence Virtuoso simulation tool and Stanford University 32 nm CNTFET verilog-A model file are used to achieve simulation results.

Performance analysis and yield estimation for a negative capacitance field effect transistor-based eight-transistor static random access memory

The read/write performance and yield of a negative capacitance field effect transistor (NCFET)-based eight-transistor (8-T) static random access memory (SRAM) are quantitatively evaluated and then compared with a conventional 8-T SRAM. The performance of the 8-T SRAM cell is analyzed by read/write metrics (i.e. read static noise margin, write-ability current and read ‘zero (0)’ current). The sensitivity of the 8-T SRAM cell to the read/write metric is estimated by quantitatively evaluating the impact of systematic variation (i.e. channel width, length and threshold voltage variation). Based on variation-aware sensitivity analysis, quantitative yield estimation is done using the ‘cell sigma’ concept. Finally, the minimum power supply voltage (V DD) (which satisfies six cell sigma for yield estimation of a NCFET-based/baseline 8-T SRAM cell) is quantitatively estimated.

Josephson-CMOS Hybrid Memory With Nanocryotrons

We present hybridization of Josephson, CMOS, and nanocryotron (nTron) devices for a large-scale cryogenic memory application. The memory system proposed here is dynamic random access memory composed of address decoders based on an energy-efficient rapid single-flux-quantum logic, nTron line drivers, a CMOS memory cell array, and Josephson current sensors. Because drivers with voltage amplification and decoders are the major causes of power dissipation in the conventional Josephson-CMOS hybrid memory, drastic reduction in power consumption is expected. We show estimates that the power consumption of a 16-Mb memory is reduced to 1.36-2.77 mW, approximately 1/12 of the conventional Josephson-CMOS hybrid memory, and the access time is 0.78 ns for a read operation, when we assume a 65-nm CMOS process and a 1.0-μm Nb/AlO x /Nb process. In the preliminary experiment, we fabricated nTrons using NbTiN thin film that are suitable for hybrid memory implementation, and measured with eight-transistor static random access memory cells fabricated using the Rohm 0.18-μm CMOS process. We successfully triggered the nTron into the normal state, and observed output voltage of ~0.1 V at 13.5 K. The experimental results support the potential of the hybrid memory using NbTiN nTrons.

A Subthreshold Symmetric SRAM Cell With High Read Stability

This brief introduces a differential eight-transistor static random access memory (SRAM) cell for subthreshold SRAM applications. The symmetric topology offers a smaller area overhead compared with other symmetric cells for the same stability in the read operation. Two transistors isolate the cell storage nodes from the read operation path to maintain the data stability of the cell. This topology improves the data stability at the expense of read operation delay. Thorough postlayout Monte Carlo worst corner simulations in 45-nm CMOS technology are conducted. The proposed cell operates down to 0.35 V with a read noise margin of 74 mV and a write noise margin of 92 mV. Under this condition, the read and write noise margins of the conventional six-transistor (6T) cell are 18 and 27 mV, respectively. The cell area is 1.57× the conventional 6T SRAM cell area in 45-nm design rules.

Carbon Nanotube SRAM Design With Metallic CNT or Removed Metallic CNT Tolerant Approaches

A study of an eight-transistor static random access memory (SRAM) cell and its implementation in carbon nanotube FET (CNTFET) technology are presented. Simulations of the CNTFET SRAM cell design, using a CNT SPICE model, have shown advantages over the CMOS cell in terms of static power, dynamic power, and noise margin. However, current CNT synthesis processes grow metallic CNTs alongside semiconductor CNTs. This in turn greatly degrades the performance and functionality of SRAM cells. In this paper, we present and compare two approaches to overcome the presence of metallic CNTs. The first approach tolerates metallic CNTs and uses a series of uncorrelated CNTs to form a transistor; this provides tolerance to metallic CNTs. The second approach uses an M × N array of uncorrelated CNTs to form a CNTFET and requires technologies capable of removing metallic CNTs. Both approaches have similar static noise margin. The second approach (removed metallic CNTs) consumes 1.45× more static power; on the other hand, its CNT count and write delay are reduced to 35.6% and 10.9% of the metallic tolerant approach, respectively. The realization of large memory modules in the presence of faulty SRAM cells can be achieved by having memory modules with as few as two spare columns.