Effective Schottky Barrier Height Research Articles

Electronic Transport Modulation in Ultrastrained Silicon Nanowire Devices.

In this work, we explore the effect of ultrahigh tensile strain on electrical transport properties of silicon. By integrating vapor-liquid-solid-grown nanowires into a micromechanical straining device, we demonstrate uniaxial tensile strain levels up to 9.5%. Thereby the triply degenerated phonon dispersion relation at the Γ-point of silicon disentangle and the longitudinal phonon modes are used to precisely determine the extent of mechanical strain. Simultaneous electrical transport measurements showed a significant enhancement in the electrical conductance. Aside from considerable reduction of the Si bulk resistivity due to strain-induced band gap narrowing, comparison with quasi-particle GW calculations further reveals that the effective Schottky barrier height at the electrical contacts undergoes a substantial reduction. For these reasons, nanowire devices with ultrastrained channels may be promising candidates for future applications of high-performance silicon-based devices.

An Atomically Resolved Schottky Barrier Height Approach for Bridging the Gap between Theory and Experiment at Metal-Semiconductor Heterojunctions.

We propose an atomically resolved approach to capture the spatial variations of the Schottky barrier height (SBH) at metal-semiconductor heterojunctions. This proposed scheme, based on atom-specific partial density of states (PDOS) calculations, further enables calculation of the effective SBH that aligns with conductance measurements. We apply this approach to study the variations of SBH at MoS2@Au heterojunctions, in which MoS2 contains conducting and semiconducting grain boundaries (GBs). Our results reveal that there are significant variations in SBH at atoms in the defected heterojunctions. Of particular interest is the fact that the SBH in some areas with extended defects approaches zero, indicating Ohmic contact. One important implication of this finding is that the effective SBH should be intrinsically dependent on the defect density and character. Remarkably, the obtained effective SBH values demonstrate good agreement with existing experimental measurements. Thus, the present study addresses two long-standing challenges associated with SBH in MoS2-metal heterojunctions: the wide variation in experimentally measured SBH values at MoS2@metal heterojunctions and the large discrepancy between density-functional-theory-predicted and experimentally measured SBH values. Our proposed approach points out a valuable pathway for understanding and manipulating SBHs at metal-semiconductor heterojunctions.

On the temperature dependence of the current conduction mode in non-homogeneous Pt/n-GaN Schottky barrier diode

Forward current-voltage (I–V) measurements of Pt/n-GaN Schottky barrier diode (SBD) are investigated in a wide temperature range (80–400 K). The temperature dependence of the effective Schottky barrier height (SBH) and ideality factor are analyzed on the basis of the thermionic emission (TE) model by considering a double Gaussian distribution (DGD) of SBH due to the presence of barrier height inhomogeneities at the Pt/n-GaN interface. In the high temperature (HT) region (200–400 K), Pt/n-GaN SBD exhibits nearly an ideal behavior in accordance with the TE conduction mode. The obtained values of the homogeneous SBH Φ‾0bn = 1.33 eV and Richardson constant AHT* = 26.86 A cm−2 K−2are in agreement with the theoretical values for n-type GaN. In the low temperature (LT) region (80–160 K), the corresponding values Φ‾0bn = 0.94 eV and ALT* = 14.74 A cm−2 K−2 deduced within the TE mode deviate strongly from the ideal behavior. This deviation is further confirmed by the large ideality factor. In this work, we provide a strong evidence that the tunneling current including thermionic field emission (TFE) largely dominates the conduction mode at low temperature.

Understanding the Electronic Transport of Al-Si and Al-Ge Nanojunctions by Exploiting Temperature-Dependent Bias Spectroscopy.

Understanding the electronic transport of metal-semiconductor heterojunctions is of utmost importance for a wide range of emerging nanoelectronic devices like adaptive transistors, biosensors, and quantum devices. Here, we provide a comparison and in-depth discussion of the investigated Schottky heterojunction devices based on Si and Ge nanowires contacted with pure single-crystal Al. Key for the fabrication of these devices is the selective solid-state metal-semiconductor exchange of Si and Ge nanowires into Al, delivering void-free, single-crystal Al contacts with flat Schottky junctions, distinct from the bulk counterparts. Thereof, a systematic comparison of the temperature-dependent charge carrier injection and transport in Si and Ge by means of current-bias spectroscopy is visualized by 2D colormaps. Thus, it reveals important insights into the operation mechanisms and regimes that cannot be exploited by conventional single-sweep output and transfer characteristics. Importantly, it was found that the Al-Si system shows symmetric effective Schottky barrier (SB) heights for holes and electrons, whereas the Al-Ge system reveals a highly transparent contact for holes due to Fermi level pinning close to the valence band with charge carrier injection saturation due to a thinned effective SB. Moreover, thermionic field emission limits the overall electron conduction, indicating a distinct SB for electrons.

Au-MoS2 contacts: Quantum transport simulations using a continuum description

We present a novel method of modeling the contact between a metal and a two-dimensional semiconductor. Using Au on MoS2 as an example, we self-consistently solve the Schrödinger and Poisson equations and obtain the charge density in the contact. We consider open boundary conditions using the quantum transmitting boundary method and model the electron current through the contact region. We then investigate the effect of effective Schottky barrier height, electrostatic doping, and length of the overlap region on the contact resistance in a top contact geometry. By using data from experiments or from ab initio calculations for the fitting of parameters, such as the effective Schottky barrier height, the model can be used to efficiently obtain the contact resistance and, therefore, the quality of the contact. Furthermore, we investigate the effect of sampling of the Brillouin zone in the transverse direction on the numerical calculation of key quantities, such as contact resistance and free charge density. Additionally, we show that the boundary conditions applied to the Poisson equation during the calculation of the free charge density have a significant impact on the calculated contact resistance and that the impact is more pronounced in heterostructures with a larger Schottky barrier. We found that the contact resistance may be significantly underestimated, by up to one order of magnitude, when the height of the simulation domain is not large enough.

Properties of Schottky barrier diodes on heteroeptixial α-Ga2O3 thin films

Schottky barrier diodes on α−Ga2O3:Sn heteroepitaxial thin films grown by pulsed laser deposition on m-plane sapphire substrates are reported. Sets of co-planar diodes were fabricated with different metals and different deposition methods. The current rectification and effective Schottky barrier height of oxidized contacts realized by reactive sputtering significantly exceed the values of non-oxidized contacts realized by thermal evaporation or sputtering in an inert argon atmosphere. The best values obtained are rectification of about eight orders of magnitude (±2 V) and 1.3 eV effective barrier height. The current-voltage characteristics of selected non-oxidized and oxidized platinum diodes have been studied as a function of measurement temperature. The temperature dependence of the effective barrier height and the ideality factor of the diodes were fitted taking into account the lateral potential fluctuations of the barrier potential. The determined mean barrier heights and standard deviations are in the range of 1.76–2.53 and 0.2–0.33 eV, respectively, and are classified with respect to the literature and fulfill a well-established empirical correlation (Lajn’s rule) for a variety of Schottky barrier diodes on different semiconducting materials.

Interfacial properties of In-plane monolayer 2H-MoTe2/1T'-WTe2 heterostructures

One of the most appealing aspects of the two-dimensional transition-metal dichalcogenides (2D-TMDs) is that they have a variety of crystal types, which can exist in three different atomic lattices, 2H, 1 T and 1 T', and can therefore exhibit diverse electronic properties. In addition, 2D-TMD heterostructures with distinctive features can be generated by combining two monolayers either vertically or laterally (in-plane). In this work, we used first-principles calculations to explore the structural and electronic properties of the H-phase MoTe2 monolayer, the T'-phase WTe2 monolayer, and their in-plane heterostructures (H-MoTe2/T'-WTe2). The H-phase MoTe2 monolayer has a band structure with a direct band gap, whereas the 1 T'-WTe2 monolayer is projected to be a Weyl semimetal based on our findings. We constructed a series of five relatively stable in-plane H-MoTe2/T'-WTe2 heterostructures with metal–semiconductor and studied their electronic properties. The band structures of these in-plane heterostructures were shown to be strongly related to the relative orientations of the monolayers at the interface. In particular, the band gaps of the heterostructures joined along the armchair direction were found to be smaller than 0.1 eV. By sewing the MoTe2 and WTe2 monolayers along the zigzag direction, two relatively stable structures were created, with according to the band structure analysis, exhibited metallic characteristics. Surprisingly, band inversion appeared near the Fermi level due to boundary effects. Therefore, topological properties may be present in such in-plane heterostructures. Moreover, some of these in-plane H-MoTe2/T'-WTe2 heterostructures have effective Schottky barrier heights smaller than 0.25 eV for holes, and could thus be used to construct field effect transistors (FETs). We also found that the effective Schottky barrier height was largely determined by the interfacial bonding environment, the external electric field, and uniaxial strains. Our findings enrich the diversity of the 2D-TMDs heterostructures and point to a viable approach for the design of high-performance electronic and optoelectronic devices.

Vertical Nonvolatile Schottky‐Barrier‐Field‐Effect Transistor with Self‐Gating Semimetal Contact

AbstractEmerging 2D nonvolatile Schottky‐barrier‐field‐effect transistors (NSBFETs) are envisaged to build a promising reconfigurable in‐memory architecture to mimic the brain. Herein, a vertically stacked multilayered graphene (MGr)‐molybdenum disufide (MoS2)‐tungsten ditelluride (WTe2) NSBFET is reported. The semimetal WTe2 with the charge‐trapping effect enables the simultaneous integration of the electrode and the self‐gating function. The effective Schottky barrier height offset ΔΦB is programed from ΔΦB‐p = 132.6 meV to ΔΦB‐n = 109.4 meV, inducing the reversed built‐in electric field to make the NSBFET, so as to provide one with a multifunctional platform to integrate the nonvolatility and the reconfigurable self‐powered photo response. The reversible open‐circuit voltages of NSBFET synapse are programmed from −0.1 to 0.25 V and the self‐powered responsivity with reversed signs is tuned from 290 to −50 mA W−1, which enables the representation of a signed weight in a single device to enrich multiple optical sensing and computing capabilities.

Ultrawide bandgap vertical β-(AlxGa1−x)2O3 Schottky barrier diodes on free-standing β-Ga2O3 substrates

Ultrawide bandgap β-(AlxGa1−x)2O3 vertical Schottky barrier diodes on (010) β-Ga2O3 substrates are demonstrated. The β-(AlxGa1−x)2O3 epilayer has an Al composition of 21% and a nominal Si doping of 2 × 1017 cm−3 grown by molecular beam epitaxy. Pt/Ti/Au has been employed as the top Schottky contact, whereas Ti/Au has been utilized as the bottom Ohmic contact. The fabricated devices show excellent rectification with a high on/off ratio of ∼109, a turn-on voltage of 1.5 V, and an on-resistance of 3.4 mΩ cm2. Temperature-dependent forward current-voltage characteristics show effective Schottky barrier height varied from 0.91 to 1.18 eV while the ideality factor from 1.8 to 1.1 with increasing temperatures, which is ascribed to the inhomogeneity of the metal/semiconductor interface. The Schottky barrier height was considered a Gaussian distribution of potential, where the extracted mean barrier height and a standard deviation at zero bias were 1.81 and 0.18 eV, respectively. A comprehensive analysis of the device leakage was performed to identify possible leakage mechanisms by studying temperature-dependent reverse current-voltage characteristics. At reverse bias, due to the large Schottky barrier height, the contributions from thermionic emission and thermionic field emission are negligible. By fitting reverse leakage currents at different temperatures, it was identified that Poole–Frenkel emission and trap-assisted tunneling are the main leakage mechanisms at high- and low-temperature regimes, respectively. Electrons can tunnel through the Schottky barrier assisted by traps at low temperatures, while they can escape these traps at high temperatures and be transported under high electric fields. This work can serve as an important reference for the future development of ultrawide bandgap β-(AlxGa1−x)2O3 power electronics, RF electronics, and ultraviolet photonics.

Schottky barrier contact on In0.53Ga0.47As with short-wave infrared transparent conductive oxide

In this study, we fabricate and investigate Schottky barrier contact on n- and p-type In0.53Ga0.47As with transparent conductive oxide (TCO) that transmits light from the visible to short-wave infrared (SWIR) region. The TCO/p-In0.53Ga0.47As contact exhibits explicit rectifying behavior in current–voltage measurement, with an effective Schottky barrier height of 0.587 eV (I–V) and 0.567 eV (C–V). Conversely, the TCO/n-In0.53Ga0.47As exhibits the Ohmic behavior. From high-resolution transmission electron microscopy observations, we identified two types of interfacial layers between TCO and InGaAs: an In/Ga-rich InGaAs oxide layer and an In/Ga-deficient InGaAs layer. These interfacial layers may have a significant impact on the performance of the Schottky barrier contact. An ultra-thin Ni-layer insertion at the TCO/n+-InGaAs interface reduces the contact resistivity by more than an order of magnitude while maintaining high transparency. The TCO/p-InGaAs Schottky barrier contact also performs broadband light detection from the visible to SWIR region in a front-side illumination manner, which is highly promising for detecting wavelengths covering the optical communication band.

Effective Schottky barrier height and interface trap density reduction engineering using 2-dimensional reduced graphene oxide interlayer for metal-interlayer-semiconductor contact structure

The contact resistance at the metal-semiconductor (MS) interface has become the foremost challenge to ensuring high performance in nanoelectronics as devices are scaled down. A metal-interlayer-semiconductor (MIS) contact structure is a promising technique for Fermi-level unpinning to overcome the issue of fundamental contact resistance. Herein, an MIS contact structure with a 2-dimensional reduced graphene oxide (rGO) interlayer is proposed as an effective source/drain contact structure. The demonstration of a metal-rGO-semiconductor MIS (rGO MIS) contact structure with different interlayer thicknesses indicated that the rGO interlayer with a thickness of a few nanometers significantly enhanced the reverse current density (JR) by ∼2.0 × 103 times compared to that of the MS contact. In addition, the effective Schottky barrier height was reduced from 0.576 to 0.205 eV. This drastic improvement is attributed to the unique properties of rGO, such as its wide band gap, electrical conductivity, and Van der Waals interface leading to a metal-induced gap state reduction, tunneling resistance lowering, and passivation effect when it is adopted as an interlayer of the MIS contact. This result demonstrates the promising potential of using rGO as an MIS interlayer, which will pave the way toward high-performance emerging nanoelectronic devices.

Schottky-like barrier characterization of field-effect transistors with multiple quasi-ballistic channels

The potential barrier height at the interface formed by a metal contact and multiple one-dimensional (1D) quasi-ballistic channels in field-effect transistors is evaluated across different carbon nanotube and nanowire device technologies by means of a Landauer–Büttiker-based extraction methodology (LBM) adapted for multiple 1D-channels. The extraction methodology yields values for an effective Schottky barrier height and a gate coupling coefficient, an indicator of the device working at the quantum capacitance limit. The novel LBM-based approach embracing the mechanisms in 1D electronics is compared to the conventional activation energy method not considering such effects. The latter approach underestimates the potential barrier height at metal–channel interfaces in comparison to the novel methodology. A test structure based on a displaced gate device is proposed based on numerical device simulation results toward an improved accuracy of the method.

Reduced Schottky barrier height at metal/CVD-grown MoTe2 interface

We demonstrated that Schottky barrier height (SBH) at the metal/CVD-grown MoTe2 interface can be significantly reduced with tunnel contact by inserting a thin Al2O3 layer regardless of the metal work function. The existence of strong Fermi level pinning (FLP) at the metal/MoTe2 interface was verified, while depinning cannot be achieved with Al2O3 insertion. Thus, the fixed charges inside the Al2O3 were proposed to be responsible for the effective SBH reduction in virtue of the eliminated SBH reduction after the post-annealing treatment. This work provides a feasible way to solve the contact issue and favors for the fabrication of high performance MoTe2-based electronic devices.

Fermi-Level Depinning in Metal/Ge Junctions by Inserting a Carbon Nanotube Layer.

Germanium (Ge)-based devices are recognized as one of the most promising next-generation technologies for extending Moore's law. However, one of the critical issues is Fermi-level pinning (FLP) at the metal/n-Ge interface, and the resulting large contact resistance seriously degrades their performance. The insertion of a thin layer is one main technique for FLP modulation; however, the contact resistance is still limited by the remaining barrier height and the resistance induced by the insertion layer. In addition, the proposed depinning mechanisms are also controversial. Here, the authors report a wafer-scale carbon nanotube (CNT) insertion method to alleviate FLP. The inserted conductive film reduces the effective Schottky barrier height without inducing a large resistance, leading to ohmic contact and the smallest contact resistance between a metal and a lightly doped n-Ge. These devices also indicate that the metal-induced gap states mechanism is responsible for the pinning. Based on the proposed technology, a wafer-scale planar diode array is fabricated at room temperature without using the traditional ion-implantation and annealing technology, achieving an on-to-off current ratio of 4.59 × 104 . This work provides a new way of FLP modulation that helps to improve device performance with new materials.

Silicon carbide of 4H-SiC type Schottky diode current-voltage characteristics in small-sized type metal-polymeric package SOT-89

The forward and reverse current–voltage characteristics of Ti/Al/4H-SiC Schottky diode type DDSH411A91 in modern small-sized (SOT-89) type metal-polymeric package have been obtained. In forward direction (current up to 2 A) on the basis of analysis it is shown that Schottky diode corresponds to the "ideal" diode with ideality factor n=1.12 and effective Schottky barrier height φB =1.2 eV. It is shown that reverse current-voltage characteristics (breakdown voltage 1200 V) can be well approximated by mechanism of field dependence of barrier height lowering by the presence of the intermediate layer in the form of oxide on the 4H-SiC surface.

Atomic layer deposited Al2O3 passivation layer for few-layer WS2 field effect transistors

We have investigated the effect of an Al2O3 passivation layer on the performance of few-layer WS2 FETs. While the performance of WS2 FETs is often limited by a substantial decrease in carrier mobility owing to charged impurities and a Schottky barrier between the WS2 and metal electrodes, the introduction of an Al2O3 overlayer by atomic layer deposition (ALD) suppressed the influence of charged impurities by high-κ dielectric screening effect and reduced the effective Schottky barrier height. We argue that n-doping of WS2, induced by positive fixed charges formed at Al2O3/WS2 interface during the ALD process, is responsible for the reduction of the effective Schottky barrier height in the devices. In addition, the Al2O3 passivation layer protected the device from oxidation, and maintained stable electrical performance of the WS2 FETs over 57 d. Thus, the ALD of Al2O3 overlayer provides a facile method to enhance the performance of WS2 FETs and to ensure ambient stability.

Electrically or chemically tunable photodetector with ultra high responsivity using graphene/InN nanowire based mixed dimensional barristors

In this work, an electrically/chemically tunable highly sensitive photodetector based on mixed dimensional heterojunction of graphene and planar InN nanowires (NW) is presented. Controlled partial oxidation of InN has been employed to effectively reduce the high surface carrier concentration of InN, which normally prevents it from forming good rectifying contact with graphene. The resulting surface modified InN NWs have been found to form excellent Schottky junction with graphene, with an increase in effective Schottky barrier height (SBH) by over 1.1 eV and a ratio of forward and reverse bias currents exceeding 4 orders of magnitude. Moreover, very strong barristor (gate tunable heterojunction) action has been observed, with I on/I off ≈ 4 orders of magnitude, and SBH increase by >0.3 eV. The barristor has been demonstrated to be highly sensitive to light, especially in the ultra-voilet, visible and near IR spectra. Responsivity was found to be widely tunable by gate voltage, with the highest value exceeding 1000 A W−1. Rise and fall times being in the range of hundreds of ms are indicative of photoconductive gain, which can be attributed to the ultra high responsivity. A method of semi-permanent molecular doping has been demonstrated to realize a two-terminal version of the photodetector, where the desired responsivity can still be achieved without requiring a back gate terminal, enabling the device to be realized on insulating substrates. The effect of encapsulation has been studied as a function of time, which has showed the long term stability of the dopant-induced enhancement and ultra high responsivity of the barristor photodetector.

Strain-Induced Spatially Resolved Charge Transport in 2H-MoTe2

Strain engineering offers unique control to manipulate the electronic band structure of two-dimensional (2D) materials, resulting in an effective and continuous tuning of the physical properties. Ad hoc straining of 2D materials has demonstrated state of the art photonic devices including efficient photodetectors at telecommunication frequencies, enhanced-mobility transistors, and on-chip single photon sources, for example. However, in order to gain insights into the underlying mechanism required to enhance the performance of the next-generation devices with strain(op)tronics, it is imperative to understand the nano- and microscopic properties as a function of a strong nonhomogeneous strain. Here, we study the strain-induced variation of local conductivity of a few-layer transition metal dichalcogenide using conductive atomic force microscopy. We report a strain characterization technique by capturing the electrical conductivity variations induced by local strain originating from surface topography at the nanoscale, which allows overcoming limitations of existing optical spectroscopy techniques. We show that the conductivity variations parallel the strain deviations across the geometry predicted by molecular dynamics simulation. These results substantiate a variation of the effective mass and surface charge density by 0.026me and 0.03e for every percent of uniaxial strain, respectively, derived using band structure calculation based on the first-principles density functional theory. Furthermore, we demonstrate modulation of the effective Schottky barrier height by quantifying its alteration originating from a gradual reduction of the conduction band minima as a function of tensile strain. Such spatially textured electronic behavior via surface topography-induced strain variations in atomistic-layered materials at the nanoscale opens up exciting opportunities to control fundamental material properties and offers a myriad of design and functional device possibilities, such as for electronics, nanophotonics, flextronics, or smart cloths.

On the nature of photosensitivity gain in Ga2O3 Schottky diode detectors: Effects of hole trapping by deep acceptors

Lightly n-type doped Ga2O3 layers grown by Halide Vapor Phase Epitaxy (HVPE) on bulk n+-Ga2O3 substrates were subjected to irradiation with fast reactor neutrons, 20 MeV protons, or treatment in high ion density Ar plasma. These treatments lead to a marked increase in the concentration of deep acceptors in the lower half of the bandgap. These acceptors have optical ionization thresholds near 2.3 eV and 3.1 eV. There is a simultaneous strong enhancement of the photocurrent of Schottky diodes fabricated on these layers in the UV spectral range, and a large increase in the Electron Beam Induced Current (EBIC) collection efficiency. The gain in photocurrent at −10 V reached 18 times for neutron and proton irradiated samples, and 104 times for the plasma treated samples. Similar increases in gain were observed in the EBIC current collection efficiency for beam energy 4 keV. With such beam energy, the electron–hole pairs are generated well within the space charge region. The results are explained by assuming that the capture of photoinduced or electron-beam-induced holes by the deep acceptors gives rise to a decrease in the effective Schottky barrier height and an increase of the electron current flow that is responsible for the observed high gain. The reported observation could form a basis for radical improvement of photosensitivity of Ga2O3-based solar-blind photodetectors. However, the photocurrent build-up and decay times in this mechanism are inherently long, on the order of some seconds.

Leakage current characteristics and DC resistance degradation mechanisms in Nb doped PZT films

The correlation between defect chemistry, leakage currents, and time-dependent dielectric breakdown was studied for PbZr0.52Ti0.48O3 (PZT) films doped with 0.5, 1, 2, or 4 mol. % Nb. As the samples are nearly intrinsic (that is, close to n- to p-type transition), signatures for both hole hopping between Pb2+ and Pb3+ and electron trapping by Ti4+ were observed. For all doping levels, the dominant conduction mechanism transitioned from Poole–Frenkel emission at lower electric fields to Schottky emission at higher electric fields. The electric field for this transition diminishes from 172 to 82 kV/cm with decreasing Nb concentration. The concomitant modification of the Schottky barrier height from 1.24 to 0.95 eV with decreasing Nb concentration is attributed to Fermi level pinning via oxygen vacancies. The DC resistance degradation was controlled by Schottky emission from 250 to 400 kV/cm. It was found that the lifetime of the films increases with increasing the Nb level. The effective Schottky barrier height for 2 mol. % Nb-doped PZT films decreased from 1.12 to 0.85 eV during degradation. This is related to the movement of oxygen vacancies toward the cathode and the observation of Ti3+ near the cathode, which are proved via thermally stimulated depolarization current and electron energy loss spectroscopy, respectively. Furthermore, Schottky emission starts to control the conduction at lower electric fields after degradation as a result of oxygen vacancy accumulation near the cathode. This, in turn, decreases the potential barrier height for electron injection from the Pt electrode into the PZT films. The mechanisms for time-dependent dielectric breakdown in PZT films will thus be a strong function of the initial oxygen vacancy concentration and its distribution within the PZT films.