The dc performance of a Ga0.52In0.48P/In0.2Ga0.8As/Ga0.52In0.48P double heterojunction pseudomorphic high electron mobility transistor (DH-pHEMT) grown on GaAs substrate has been simulated using a two-dimensional device simulator, to investigate the dependence of the intrinsic and extrinsic transconductance on the device channel thickness. The electron sheet concentration values for different channel thicknesses have been calculated using an analytical model, and correspond very well to Hall effect measurements of the electron mobility. Simulation results reveal that the optimum channel thickness for maximum intrinsic transconductance is between 80 and 100Å, while there is no significant difference in the maximum extrinsic transconductance for channel thicknesses between 80 and 140Å. This is due to a trade-off between electron sheet concentration and gate-to-channel separation. In addition, narrow channels give larger effective band gap due to energy quantization, which could contribute to an optimum design for Ga0.52In0.48P/In0.2Ga0.8As/Ga0.52In0.48P DH-pHEMTs.
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