With the use of reactive plasma-ion deposition, thin nano-sized films of AlN were obtained on the substrates of GaAs(100) with a different degree of misorientation relative to the <100> direction.It was shown that the growth of the AlN films on GaAs substrates with a small degree of misorientation resulted in the formation of the AlN films in the nano-crystalline state. Hence, the film with a cubic crystal system was formed on a precisely oriented GaAs substrate, while on the substrate with 2° misorientation, the film consisted of a mixture of the AlN phases with cubic and hexagonal crystal symmetry. At the same time, the growth of the films on the substrates with a high degree of misorientation resulted in the disappearance of the long-range order in the crystalline structure of the AlN films; this implied the formation of the AlN phase in the amorphous state. The misorientation of the GaAs(100) substrate affected the sizes of the nano-islands formed on the surface of the AlN film. The lower the misorientation of the GaAs(100) substrate, the smaller were the lateral sizes of the nano-islands.Comparing our data for the optical band gap and the dispersion of the refractive index obtained by reactive ion-plasma deposition and the results for the AlN films grown by reactive sputtering, which is the closest method to the technology used in our work, we found that depending on the conditions of the reactive sputtering, nano-sized films of AlN with refractive index values within the range of 2.26–2.38 for the energy range of ∼4.7–4.9 eV and optical band gaps within 5.34–5.71 eV, were obtained. It was possible to obtain thin films with refractive index values within the range of 1.65–3.35 for energy values of ∼4.7–4.9 eV and optical band gaps of ∼5–6.2 eV by the application of the AlN deposition on the surface of semiconductor materials proposed in this study.An increase in the misorientation degree for the GaAs substrate was observed along with an improvement in the structural quality of nano-sized AlN films as well as in their electron structure, surface morphology, and optical properties. Thus, the morphology, surface composition, and optical functional characteristics of hetero-phase AlN/GaAs systems can be controlled by using GaAs substrates with a specified degree of misorientation relative to the <100> direction.
Read full abstract