Afterglows of R/x(N2–5%H2) (R = Ar or He) flowing microwave discharges are characterized by optical emission spectroscopy. Absolute densities of N atoms and N2(A) and N2(X,v > 13) molecules and estimated densities of NH and H atoms are determined after calibration of the N atom density by NO titration. It is determined the variations of active species densities along the post-discharge tube from the early afterglow to the late afterglow region. Conditions allowing to obtain a high concentration of H-atoms in dominant N-atoms have been found in the early afterglow region of the R/x(N2–5%H2) mixture for x < 5%. From these densities, the destruction probabilities of the H-atoms on the afterglow quartz tube wall is found to be: $$\gamma_{H}^{He}$$ = (2–3) × 10−4 and $$\gamma_{H}^{Ar}$$ = (3–4) × 10−3. The interest of these results concerns the enhancement of surface nitriding by combined effects of N and H atoms inclusion in afterglow conditions.
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