Ga doped SnO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> Nanowires (Ga: SnO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> NWs) based UV photodetector (PD) were fabricated over Si substrate using glancing angle deposition technique. Among various doping concentrations, the 5% Ga: SnO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> NWs device exhibited the least dark current (2.67 nA) with high barrier height and highest rectification ratio (~54.6) at −1 V. Samples with Ga doping concentration higher than 5%, induced extra defect level limiting their device performance. Moreover, the 5% Ga: SnO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> NWs PD exhibited responsivity and specific detectivity of 16.48 A/W and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$6.33\times 10^{13}$ </tex-math></inline-formula> Jones respectively (at 300 nm) and a low noise equivalent power of 53 fW. Furthermore, this device showed fast photoresponse with a rise and fall time of 2 ms and 1.5 ms respectively after doping. Therefore, this letter demonstrates a well-controlled Ga: SnO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> NWs based high performance, low-cost UV-PD.
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