The demand for ferrites in the form of thin films enhanced in the last few years due to the growth in microwave and semiconductor industries. LiDy0.1Fe4.9O8 films and their capacitors are fabricated on Pt(111)/Ti/SiO2/Si having different thicknesses using PLD. The formation of phase are confirmed by XRD and Raman spectra. The lattice constant and strain decreased, whereas the average grain size increased with the increase in thickness. The XPS spectra confirmed the presence of all the constituent elements with an appropriate valance state. The surface micrograph evident the inhibition of uniform grain growth having minimal roughness up to 13 nm. The dielectric constant increased with the thickness and temperature and reduced with the frequency, whereas the loss tangent decreased with the film thickness. The in-plane and out-of-plane magnetization degraded, whereas the coercivity enhanced with the film thickness. This variation is explained based on the lattice mismatch, grain size, and magnetoelastic energy density. Out of the various conduction mechanisms, Mott's VRH is recognized as the most appropriate mechanism for the deposited films. The varying thickness of a film is an effective parameter for tuning the physical properties of the film. The observed results suggest that LDFO films are promising for magnetic oxide semiconductor applications.