Multilayered amorphous hydrogenated carbon (a-C:H) films consisting of alternating sublayers with different mechanical properties have been deposited by an electron cyclotron resonance microwave-plasma chemical vapor deposition (ECR MP-CVD) system and modulating substrate bias voltage. The mechanical properties of the multilayer films were determined using nanoindentation and nanoscratch experiments with reference to single a-C:H layers of which the multilayer structure were composed. In nanoindentation tests, the relationship between the film hardness and indentation depth has been obtained over an indentation depth range of 20–500 nm. Since the films tend to fracture under high load in nanoindentation tests, their critical fracture loads were determined. The critical loads for fracturing the multilayered a-C:H films were higher than those of single a-C:H layers. The nanoscratch tests also showed that the multilayered a-C:H films required a higher critical load for scratching fracture. This study implies that the mechanical properties of a-C:H film can be improved by engineering suitable multilayer structures.
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