Corona Discharge Process Research Articles

Corona charging of polymers

A review of the corona charging of polymers is presented. After providing a brief account of the corona discharge process and of its application for charging materials, the paper focuses on the evolution of corona triodes that allow the sample surface potential to be monitored during the charging process. Particular emphasis is given to the main contributions arising from research, basically on Teflon FEP and ferroelectric polymers, in which a constant-current corona triode was used. Such a triode system has become a powerful tool in the study of charge transport and ferroelectric properties of polymers, because keeping the charging current constant facilitates matching of the experimental results to a number of theoretical models.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

Corona discharge processes

Applications of corona discharge induced plasmas and unipolar ions are reviewed. Corona process applications emphasize one of two aspects of the discharge: the ions produced or the energetic electrons producing the plasma. The ion identities depend on the polarity of the discharge and the characteristics of the gas mixture, specifically on the electron attaching species. The electron energies depend on the gas characteristics and on the method of generating the corona. In general, in an application using ions, the corona induced plasma zone will occupy a small fraction of the total process volume, while a process using the electrons will fill most of the volume with the plasma. Current state-of-the knowledge of ionized environments and the function of corona discharge processes are discussed in detail.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

Corona-Discharge-Induced Stress Relaxation in Silicon Dioxide Films on Silicon

AbstractVariations in refractive index (density) with growth temperature are taken as a rough measure of residual compressive stress in dry SiO2 films. This paper presents experimental data regarding the relaxation of these stresses by a low-temperature (600–900°C) oxygen corona discharge process. For an initial oxide layer of 1100 Å thickness grown at 800°C, relaxation is complete after a corona treatment of 10 minutes at -lμA. The dose of O− ions required is found to be about 1–1.5% of the total oxygen atoms in the initial layer. The difference in dose between oxide on (111) and (100) Si is found to be proportional to the respective density changes from the initial oxide to fully relaxed oxide.