Concentration Of HBr Research Articles

ChemInform Abstract: Chemical Etching of (001)InP by HBr‐H2O2‐H2O‐HCl Solution.

AbstractThe etching behavior of the new etchant system of title studied using (001)InGaAsP/InP wafers is found to depend on the relative concentration of HCl and HBr.

Correlation between the acidity and acid concentration in aqueous-alcoholic solutions of H2SO4 and H2SO4, with HBr

1. Determination has been made of the concentration of alkylsulfuric acid and the 2,4-dinitroaniline indicator ratio, in H2SO4 solutions (6.6–9.5 mole/liter) in water-n-C3H7OH mixtures (1.5 and 2.5 mole/liter) at 25°C. 2. The acidity functions of aqueous-alcoholic H2SO4 + HBr solutions and aqueous H2SO4 solutions change by the same amount under similar changes in the ratios: sum of the concentration of H2SO4 not bound in the alkyl acid and the concentration of HBr to the sum of the concentration of the bases, in the aqueous-alcoholic solution, and the concentration of H2SO4 to the concentration of H2O, in the aqueous solution. The calculations assumed that each molecule of the alkyl acid was firmly bound to a single water molecule.

ChemInform Abstract: STUDIES OF THERMOCHEMICAL HYDROGEN PRODUCTION. VII. VAPOR‐LIQUID EQUILIBRIUM FOR SULFUR DIOXIDE‐BROMINE‐HYDROBROMIC ACID‐SULFURIC ACID‐WATER SYSTEM

AbstractDie thermochemische H2 ‐Erzeugung aus H2O gelingt z.B. mit Hilfe der cyclischen Reaktionsfolge A‐D. Eines der Probleme dieses Cyclus besteht in der Entfernung kleiner, nicht umgewandelter SO2‐Mengen aus dem gemäß Aerzeugten HBr‐Gas, das in Reaktion Dwieder eingesetzt wird.

Studies of Thermochemical Hydrogen Production. VII. Vapor-Liquid Equilibrium for Sulfur Dioxide–Bromine–Hydrobromic Acid–Sulfuric Acid–Water System

Abstract In order to eliminate SO2 from HBr gas produced by the reaction between SO2, Br2, and H2O, vapor-liquid equilibrium measurements of the Br2–H2SO4–H2O system saturated with HBr have been made over a wide range of the constituent concentrations. Experiments were carried out in a semi-flow system at 25 °C under atmospheric pressure. The relative concentration of HBr saturated in the liquid phase decreased from 0.31 to 0.05 [mol]/[mol] with an increase in the relative H2SO4 concentration from 0.0 to 0.40 [mol]/[mol]. The solubility of Br2, as defined by Henry’s law constant, varied from 1.1 to ca. 150 atm/mol/mol with the above-mentioned decrease in the HBr concentration. The relation between the partial pressure of SO2 in the gas phase and the composition of the liquid phase was found to be expressed by the following empirical formula: PSO2=K·CHBr·CH2SO4⁄CBr2, where the value of K is 8×10−4 when C is expressed as a relative molar concentration for each species in the liquid phase. The unconverted SO2 can be effectively removed by bringing the effluent gases from the reactor into contact with a HBr-saturated aqueous solution containing an excess of Br2.

Electrodeposition of copper on a copper single-crystal (100) face in the presence of bromide ions

Studies have been made of copper electrodeposited onto a (100) face of copper from a highly purified solution of copper sulphate containing known concentrations of HBr. In the presence of a low concentration of HBr, CuBr was included in the deposit, giving rise to polycrystalline growth.

Determination of electrochemical kinetic parameters from the measurement of faradaic impedance during the growth of the dropping mercury electrode

The electrochemical kinetic parameters of the V(II)/V(III) couple in HBr solutions of different concentrations were determined from the measurement of faradaic impedance as a function of time during the growth of the dropping mercury electrode. The same method of analysis was applied to the study of the effect of uncharged surfactants on the electrode reaction of Cd(II) in 1 M NaNO3 solutions. The rate constant of the vanadium system decreased with increasing concentration of HBr; this change of the rate constant was discussed in terms of the Frumkin double-layer effect. The relationship between the rate constant of Cd(II) and coverage of the surfactants was not linear, and followed the equation based upon Parsons' model of the blocking effect. The conditional rate constant of Cd(II) in the absence of surfactants was determined to be 0.6–1.1 cm s−1 from the dependence of the rate constant on the coverage.

Determination of electrochemical kinetic parameters from the measurement of faradaic impedance during the growth of the dropping mercury electrode

The electrochemical kinetic parameters of the V(II)/V(III) couple in HBr solutions of different concentrations were determined from the measurement of faradaic impedance as a function of time during the growth of the dropping mercury electrode. The same method of analysis was applied to the study of the effect of uncharged surfactants on the electrode reaction of Cd(II) in 1 M NaNO 3 solutions. The rate constant of the vanadium system decreased with increasing concentration of HBr; this change of the rate constant was discussed in terms of the Frumkin double-layer effect. The relationship between the rate constant of Cd(II) and coverage of the surfactants was not linear, and followed the equation based upon Parsons' model of the blocking effect. The conditional rate constant of Cd(II) in the absence of surfactants was determined to be 0.6–1.1 cm s −1 from the dependence of the rate constant on the coverage.

Growth of Cu2Cl2 and Cu2Br2 on single crystal faces and polycrystalline copper during dissolution in CuSO4 + H2SO4

Cu2Cl2 and Cu2Br2 precipitate and crystallise in the form of triangular pyramids and dendrites when Cu is immersed in aerated, acid CuSO4 solution containing HC1 or HBr. The critical concentration of HC1 or HBr for this precipitation depends on the surface of the copper: Poly-crystalline < (110) < (100) < (111). In the deaerated solution there is no precipitation of Cu2Cl or Cu2Br2 even at a high concentration of HC1 or HBr when only preferential etching occurs.