Abstract Oxide transistors have attracted considerable attention in the field of integrated circuits. In this work, ZnO transistors were fabricated using atomic layer deposition process, with various width-to-length (W/L) ratios of 100/10 μm, 50/10 μm, 20/5 μm, 10/5 μm, and 10/10 μm. Among them, the ZnO transistor with a W/L ratio of 10/10 μm demonstrated superior electrical performance, including a field-effect mobility of 37.65 cm²V-1s-1, a subthreshold swing of 112.50 mV/decade, and a turn-on voltage of -0.50 V. Additionally, n-type ZnO transistors were used to design inverter circuits, where the voltage gain was found to be inversely correlated with the W/L ratio of the load transistor. A maximum voltage gain of 59.33 V/V was achieved at a supply voltage of 5 V using a load transistor with a W/L ratio of 10/5 μm. These results indicate that ZnO transistors, with optimized design, offer promising performance for future integrated circuit applications.
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