Cr(VI) stands as a profoundly toxic chemical and photocatalysis technology has shown promising potential in photocatalytic reduction of Cr(VI) to Cr(III), where the reduced Cr(III) is less toxic and can be further precipitated in a wide pH range. Metal-organic frameworks (MOFs), as emerging class of porous coordination polymers, is expected to be ideal platform for photocatalysis. In this study, defect engineering on MOFs was applied to promote photoreduction of Cr(VI). The obtained oxygen vacancy-containing MIL-125-NH2 samples showed modified electron structure, adjusted surface and porous properties, and enriched active sites. Among these oxygen vacancy-containing MIL-125-NH2 samples, the 300-M (MIL-125-NH2 heated at 300 °C for 2 h under N2 atmosphere) displayed the most remarkable performance in terms of photocatalytic Cr(VI) reduction. The pronounced efficacy of 300-M is evident from the achieved removal rate of Cr (VI), reaching an impressive 98 % in just 20 mins (19.6 mgCr(VI) g−1cata min−1), in stark contrast to MIL-125-NH2, which exhibited a modest removal rate of 53 %. Remarkably, the k-value for 300-M is 5.1 times that of MIL-125-NH2, further underscoring the superior efficiency of 300-M. The photoreduction mechanism of 300-M was further substantiated through a battery of advanced characterization techniques including transient photocurrent, electrochemical impedance spectroscopy, fluorescence spectroscopy, the Mott-Schottky analysis, and electron spin resonance. Those results disclosed that oxygen vacancies and mesopores introduced via controlled heat treatment play a pivotal role in facilitating the photoreduction of Cr(VI) within the MIL-125-NH2 structure. More advanced characterizations for the structures of photocatalysts and the photocatalytic mechanisms including charge transfer path need further studied. The systematic exploration of temperature-dependent effects on material properties opens avenues for future research in designing efficient and versatile MOF-based photocatalysts for environmental remediation applications.