A new type of sputter negative ion source has been developed in which the sputter target and the surface ionizer are enclosed in a common chamber containing cesium vapor. Optimal neutral cesium coverage of the sputter target can be achieved resulting in efficient ionization and high intensities. Some typical negative ion currents are: 30 μA of 11B −, 300 μA of 12C −, 250 μA of 16O −, 4 μA of 27Al −, 200 μA of 28Si −, 150 μA of 58Ni −, 150 μA of 63Cu − and 200 μA of 197 Au −. Emittance is relatively low, ∼ 2π mm·mrad(MeV) 1 2 for 70% of the total current, and sputter targets can be changed in 5−10 min. Since the source operates efficiently with samples of a few milligrams and yields 5−10 μA of BeO − ions from beryllium oxide and about 1 μA of 27Al − from aluminum oxide, it is likely to find application in accelerator mass spectrometry.