Carrier-selective Passivating Contacts Research Articles

23% efficient p-type crystalline silicon solar cells with hole-selective passivating contacts based on physical vapor deposition of doped silicon films

Of all the materials available to create carrier-selective passivating contacts for silicon solar cells, those based on thin films of doped silicon have permitted to achieve the highest levels of performance. The commonly used chemical vapour deposition methods use pyrophoric or toxic gases like silane, phosphine and diborane. In this letter, we propose a safer and simpler approach based on physical vapour deposition (PVD) of both the silicon and the dopant. An in-situ doped polycrystalline silicon film is formed, upon annealing, onto an ultrathin SiOx interlayer, thus providing selective conduction and surface passivation simultaneously. These properties are demonstrated here for the case of hole-selective passivating contacts, which present recombination current densities lower than 20 fA/cm2 and contact resistivities below 50 mΩ cm2. To further demonstrate the PVD approach, these contacts have been implemented in complete p-type silicon solar cells, together with a front phosphorus diffusion, achieving an open-circuit voltage of 701 mV and a conversion efficiency of 23.0%. These results show that PVD by sputtering is an attractive and reliable technology for fabricating high performance silicon solar cells.

High-efficiency black IBC c-Si solar cells with poly-Si as carrier-selective passivating contacts

In this work, we present the application of poly-Si carrier-selective passivating contacts (CSPCs) as both polarities in interdigitated back-contacted (IBC) solar cell architectures. We compared two approaches to form a gap between the back-surface field (BSF) and emitter fingers. It is proved that the gaps prepared by both approaches are efficient in preventing carriers’ recombination. To minimize the reflection losses, we developed a novel modulated surface texturing (MST) structure as anti-reflection coating (ARC). It is obtained by superposing a nano-textured SiO2 layer on the conventional micro-textured pyramids, which are passivated with a-Si:H / SiNx:H layers. This approach decouples the light harvesting from the Si surface passivation, which potentially results in the highest possible optical and electrical performances of the solar cells. The reflectance (R) of the MST-ARC is very close to that of the high-aspect ratio nano-structured silicon (black-Silicon), achieving R < 1% between 450 and 1000 nm. The J0 of MST-ARC passivated Si surface (6.3 fA/cm2) is the same as that of standard a-Si:H/SiNx:H layers passivated pyramidally-textured Si surface. By applying this novel MST-ARC in our IBC solar cell, the highest JSC observed in a device is 42.2 mA/cm2 with a VOC as high as 701 mV. A spectral response enhancement in case of the MST-ARC cell is observed over the whole wavelength range with respect to the cell with standard SiNx:H ARC. The highest efficiency achieved in this work is 23.0%, with the potential to reach 24.0% in short term by using more conductive metal fingers.

Poly-crystalline silicon-oxide films as carrier-selective passivating contacts for c-Si solar cells

The poly-Si carrier-selective passivating contacts (CSPCs) parasitically absorb a substantial amount of light, especially in the form of free carrier absorption. To minimize these losses, we developed CSPCs based on oxygen-alloyed poly-Si (poly-SiOx) and deployed them in c-Si solar cells. Transmission electron microscopy analysis indicates the presence of nanometer-scale silicon crystals within such poly-SiOx layers. By varying the O content during material deposition, we can manipulate the crystallinity of the poly-SiOx material and its absorption coefficient. Also, depending on the O content, the bandgap of the poly-SiOx material can be widened, making it transparent for longer wavelength light. Thus, we optimized the O alloying, doping, annealing, and hydrogenation conditions. As a result, an extremely high passivation quality for both n-type poly-SiOx (J0 = 3.0 fA/cm2 and iVoc = 740 mV) and p-type poly-SiOx (J0 = 17.0 fA/cm2 and iVoc = 700 mV) is obtained. A fill factor of 83.5% is measured in front/back-contacted solar cells with both polarities made up of poly-SiOx. This indicates that the carrier transport through the junction between poly-SiOx and c-Si is sufficiently efficient. To demonstrate the merit of poly-SiOx layers' high transparency at long wavelengths, they are deployed at the back side of interdigitated back-contacted (IBC) solar cells. A preliminary cell efficiency of 19.7% is obtained with much room for further improvement. Compared to an IBC solar cell with poly-Si CSPCs, a higher internal quantum efficiency at long wavelengths is observed for the IBC solar cell with poly-SiOx CSPCs, thus demonstrating the potential of poly-SiOx in enabling higher JSC.

Poly-Si(O)x passivating contacts for high-efficiency c-Si IBC solar cells

Highest conversion efficiency in crystalline silicon (c-Si) solar cells can be enabled by quenching minority carriers’ recombination at c-Si/contact interface owing to carrier-selective passivating contacts. With the semi-insulating poly-crystalline silicon (SIPOS, poly-Si) a very good passivation of c-Si surfaces was obtained. We have explored these passivating structures on IBC solar cells and obtained over 22% efficiency with over 23% within reach on the short term. We present in detail the passivation quality of p-type and n-type ion-implanted LPCVD poly-crystalline silicon (poly-Si) and its relation to the doping profile. Optimized poly-Si layers in the role of emitter and BSF showed excellent passivation (J0,emitter = 11.5 fA/cm2 and J0,BSF = 4.5 fA/cm2) and have been deployed in FSF-based IBC c-Si solar cells using a simple self-aligned patterning process. Applying an optimized passivation of FSF by PECVD a-Si:H/SiNx layer (J0,FSF = 6.5 fA/cm2) leads to a cell with efficiency of 22.1% (VOC = 709 mV, JSC = 40.7 mA/cm2, FF = 76.6%). Since over 83% FF has been reached with adjusted metallization technology on similar IBC structures, we believe 23% efficiency is within reach on the short term. Further improvement, especially at JSC level, is expected by deploying less absorbing carrier-selective passivating contacts based on poly-Si or wide bandgap poly-SiOx layers (J0 ~ 10 fA/cm2).

Silicon Solar Cell Architecture with Front Selective and Rear Full Area Ion‐Implanted Passivating Contacts

In this work, the application of carrier‐selective passivating contacts based on tunneling silicon‐dioxide and ion‐implanted poly‐Si in front and rear contacted Si solar cells is presented. This paper addresses the need to minimize the contact recombination while still keeping high short circuit current. We aim to solve such trade‐off with a novel solar cell architecture called Passivated Rear and Front ConTacts (PeRFeCT). Such design employs a selective passivating contact combined with standard homojunction on the front side in order to minimize contact recombination, while achieving high optical transparency and a full area passivating contact on the rear side. The opto‐electrical modeling of this front/rear contacted architecture indicates a potential efficiency above 26%. As technology demonstration, we also report on the optimization of front surface field and processing of 2.8 × 2.8 cm2 wide solar cells leading to a 20.1% conversion efficiency.