A quadrupole mass spectrometer with a mass range from 1 to 200 amu gives much useful information about scrubbing of contaminated effluent gases with a titanium sublimation trap. The gases investigated are CCl4 and C2 F6, which have been used to etch semiconductor materials in a glow discharge. The total pressure of test gases was measured with a capacitance manometer. The detailed experimental results of CCl4 for both continuous and intermittent titanium evaporation under various conditions are presented. It is shown that the major constituents in the residual atmosphere are always H2, CH4, and C2 H6. The toxic gas, comprised of mostly chlorine rather than the parent CCl4, was of the order of 0.1% of the total pressure. The efficiency of the trap was demonstrated even though the stainless-steel trap was not cleaned over one month. However, the titanium surface was almost inert for C2 F6.
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