The paper reports the growth and characterization of highly c-axis oriented ZnO thin films and their physical properties upon (Ga, Mg) co-doping. The films were produced on glass substrates by sol-gel spin-coating technique. X-ray diffraction (XRD) patterns of all the films reveal the presence of a hexagonal wurtzite crystal structure of ZnO with a c-axis preferred orientation and crystallite sizes in the range of 28–50 nm. Surface morphological studies reveal the granular morphology of the films. The optical transparency in the visible region increases upon doping and co-doping with a maximum (>95%) for the (1 at% Ga +3 at % Mg) co-doped ZnO thin film (assigned with code name 1G3MZO). The band gap is blue-shifted upon co-doping and found to be a maximum of 3.32 eV for the 1G3MZO film. The electrical conductivity improves upon co-doping, and an optimum value of 70.3 (Ω-cm)−1 is obtained in the 1G3MZO film. It has been concluded that the 1G3MZO film has improved transparent conductive properties and, therefore, finds application in optoelectronic devices.
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