Amorphous carbon films allow the simultaneous realization of sp 3 (diamond) bonds and sp 2 (graphite) bonds. By adjusting the sp 3 : sp 2 ratio, the film properties may be varied over a broad range and in this way be adapted to the special demands of applications. Amorphous films appear featureless, but thorough investigations by means of electron microscopy reveal two kinds of structurization on the nanometer scale [CDJ 91, DJJ 90, SXT 96, VD 96], which open a wide field for Structural optimization and furthermore lead to new applications. By periodic alteration of the deposition conditions the sp 3 : sp 2 ratio (and hence density, Stiffness and so on) may be changed from layer to layer. Such density modulated multilayer stacks of the same material can e.g. be used for X-ray mirrors of high stability against diffusional degradation [DHM 95]. Presupposition for such an application are a very regular stacking sequence and very smooth interfaces. Both aspects may be controlled by special electron microscopic techniques. Under constant (special) deposition conditions a lateral structurization on the nanometer level was found consisting of patches of fullerene-like nanoparticles (nanoonions or nanotubes) dispersed in an amorphous matrix [AKZ 97, SSB 95]. The large interest in such Structures stems from their possible application as electron emitters in flat panel displays. For these TEM investigations, foils for observation parallel and perpendicular to the carbon film were prepared. In dependence on the different structural details to be investigated, optimized electron microscopic methods have been applied: - Scattering absorption contrast allows a rough visualization of density variations (e.g. for carbon investigation with Philips CM200 FEGIST: Δp ≃ 0.5 g/cm 3 at lateral resolution of Δx ≃ 1 nm). - Phase contrast shows a much higher sensitivity (for the same microscope: Δp ≃ 0.05 g/cm 3 ). It may be adapted to the characteristic Structural length: With strong underfocussing a large area phase contrast is visible (2 - 10 nm). For higher resolution the Scherzer focus is recommended; then Δx ≃ 0.24 nm is achievable with the Philips CM200 FEGIST electron microscope. - High resolution electron microscopy allows the direct observation of the atomic arrangement, e.g. with Philips CM30FEG/UT special Tubingen electron microscope: Δx ≃0.17 nm. - Off-axis electron holograms contain the complete information of the complex image wave allowing the reconstruction of both phase and amplitude of the electron object wave. By computer correction of aberrations, resolution can be further increased (for the Philips CM200 FEGIST: down to 0.13 nm)[H 97, ORL 95]. Important tools for the evaluation of the electron micrographs are Fourier techniques for image analysis and image interpretation by accompanying computer simulations.