Addition Of Benzotriazole Research Articles

Influence Mechanism of Metal Passivator BTA on the Methanol Formation From Insulating Paper Based on ReaxFF-MD

Methanol has been proposed as a chemical indicator for assessing the aging condition of insulating paper in oil-immersed transformers. The metal passivator Benzotriazole (BTA) is widely added to insulating oil as a method to inhibit oil-sulfur corrosion. Existing researches rarely pay attention to the influence of by-products generated by BTA degradation on the methanol indicator. In this paper, the effect of BTA additives on the generation of methanol from the aging of insulating paper was investigated based on molecular dynamics simulation. Simulation results showed that the addition of BTA could promote the production of methanol from cellobiose. Then, three reaction pathways of methanol production promoted by BTA were summarized based on the simulation results. Finally, the effect of different BTA concentrations on the methanol content in the oil was analyzed by accelerated thermal aging experiments. The experimental results showed that the methanol concentration in oil was the highest at 100 mg/kg BTA concentration and the lowest at 0 mg/kg BTA concentration. The correctness of the molecular dynamics simulation results was confirmed. This work aims to explain the microscopic effect mechanism of metal passivator BTA on methanol generation during insulating paper aging from the perspective of molecular dynamics simulation.

Protection of galvanized steel using benzotriazole as a corrosion inhibitor in simulated concrete pore solution and alkali-activated fly ash solution

In this study, the natural passivation ability and chloride-induced subsequent increased levels of corrosion behaviour of galvanized steel in simulated concrete pore (SCP) solution and alkali-activated fly ash (AAFA) solution, with and without benzotriazole (BTA), were evaluated using corrosion potential (Ecorr), linear polarization resistance (LPR), electrochemical impedance spectroscopy (EIS) and cyclic potentiodynamic polarization (CPP). In addition, scanning electron microscopy and energy dispersive X-ray spectroscopy (SEM/EDS) were used to observe the morphologies of passive layers and corrosion products of galvanized steel. It was highlighted that the hydrogen evolution could be prevented by AAFA solution to some extent, thus providing a new insight on the inhibition of hydrogen evolution for galvanized steel in concrete. Moreover, due to the formation of a complex protective film, galvanized steel in AAFA solution exhibited significantly higher corrosion resistance to chloride attack than that exposed to SCP solution, which could be further enhanced by the addition of BTA.

Development of a quasi-on-time ICP-OES for analyzing electrode reaction products

A quasi-on-time system for analyzing electrode reaction products was developed by combining inductively coupled plasma-optical emission spectrometry (ICP-OES) with a hydrodynamic electrochemical technique. Numerical calculations and experiments showed that the shorter the distance of the withdrawing flow channel from the electrode end to the OES detector, the shorter the time response and the detection efficiency is 98.1%, which enables the transient determination of the generation rate for products. Application of the combined system with sufficient time resolution to the analysis of reaction species generated from a Cu electrode in a chloride-containing aqueous solution showed that the addition of benzotriazole (BTA) above a critical concentration of 10 mol m–3 is effective in inhibiting the dissolution of Cu. The development of the quasi-on-time system of analysis would enable application to a wide range of non-steady-state electrochemical reactions including corrosion.

Effect of Corrosion Inhibitor BTA on Silica Particles and their Adsorption on Copper Surface in Copper Interconnection CMP

In the process of chemical mechanical polishing (CMP) of multilayer copper wiring of integrated circuits, benzotriazole (BTA) as corrosion inhibitors and silica particles as abrasives are important components of polishing slurry. At the same time, they are also the main objects of post CMP cleaning. Under alkaline conditions (pH 10), the addition of BTA will affect the stability of silica particles, such as particle size and zeta potential, so as to affect the adsorption of particles on the copper surface. The effects of different concentrations of BTA on the adsorption of silica particles on copper surface were characterized by scanning electron microscopy (SEM), and the corresponding adsorption mechanism was also analyzed by X-ray photoelectron spectroscopy (XPS). The adsorption energies of BTA molecule and SiO2 molecule on copper surface were calculated by molecular dynamics simulation. The results show that 3 mM BTA reduces the adsorption capacity of SiO2 particles, and increasing the concentration of BTA will increase the adsorption capacity of SiO2 particles on the copper surface.

Modeling of Spinning Disc System for Charging Tendency of Ester-Based TiO2 Nanofluids Along with its Interfacial Zone

This article reports the static electrification of ester nanofluids for its use in transformers adopting the spinning disk model. The results show that the streaming current is higher for the nanofluid involving surfactant compared to its effect without surfactant. The streaming current observed is negative at the fluid–metal interface and positive at the fluid/pressboard interface. The streamline pattern along with surface velocity magnitude is simulated under different disk velocities using COMSOL and the convection current model is formulated for the identification of streaming current. The mass transfer rate with surfactant-based nanofluid shows a shift from transport regime to reaction limited regime at higher Reynolds number. Furthermore, the interfacial zone of nanofluids is discussed for the streaming behavior considering its influence with the addition of benzotriazole (BTA).

Electrolytically Ionized Abrasive-Free CMP (EAF-CMP) for Copper

Chemical–mechanical polishing (CMP) is a planarization process that utilizes chemical reactions and mechanical material removal using abrasive particles. With the increasing integration of semiconductor devices, the CMP process is gaining increasing importance in semiconductor manufacturing. Abrasive-free CMP (AF-CMP) uses chemical solutions that do not contain abrasive particles to reduce scratches and improve planarization capabilities. However, because AF-CMP does not use abrasive particles for mechanical material removal, the material removal rate (MRR) is lower than that of conventional CMP methods. In this study, we attempted to improve the material removal efficiency of AF-CMP using electrolytic ionization of a chemical solution (electrolytically ionized abrasive-free CMP; EAF-CMP). EAF-CMP had a higher MRR than AF-CMP, possibly due to the high chemical reactivity and mechanical material removal of the former. In EAF-CMP, the addition of hydrogen peroxide (H2O2) and citric acid increased the MRR, while the addition of benzotriazole (BTA) lowered this rate. The results highlight the need for studies on diverse chemical solutions and material removal mechanisms in the future.

Inhibiting effect of Benzotriazole on the stress corrosion cracking of Cu-27%Ni cupronickel and Cu-30%Zn brass in Mattsson’s solution

The performance of Benzotriazole (BTA) as a stress corrosion cracking (SCC) inhibitor is investigated for Cu-30Zn and Cu-27Ni alloys in Mattsson’s solution using electrochemical techniques and slow strain rate test (SSRT). With the addition of BTA, the polarization resistance increases for both alloys. Electrochemical impedance measurements show that BTA can form a protective film on the surface of the Cu-27Ni alloy and shifts the corrosion potential to nobler states. BTA also improves the corrosion resistance of the Cu-30Zn alloy by controlling the cathodic reaction rate and charge transfer resistance. SSRT results reveal that the presence of BTA decreases the susceptibility to SCC for both alloys; this improvement is more significant for Cu-27Ni alloy. Fractographic analysis after SSRT confirms that crack propagation regime is controlled by the BTA concentration. For Cu-27Ni alloy, fracture type changes from intergranular brittle to ductile as the protectiveness of BTA increases. Besides, BTA recovers the ductility by decreasing crack tip dissolution and growth as fewer cracks are observed around the necked area of fractured Cu-30Zn alloy tensile sample.

Effects of benzotriazole and imidazoline on the tribocorrosion behaviors of a WC-based material in saline silica slurries

To improve the performance of impregnated diamond bit in saline drilling fluid, the effects of benzotriazole and imidazoline on the abrasion–corrosion behaviors of a hot-pressed WC-based material and its binder material in saline silica slurries were investigated with a modified abrasion test rig. The morphology of worn surface and corrosion products after tribocorrosion test were analyzed by scanning electron microscopy and Raman spectroscopy, respectively. The results indicated that benzotriazole was a better corrosion inhibitor for the two hot-pressed materials than imidazoline. In abrasion-corrosion tests, the addition of benzotriazole into saline slurry reduced the total weight loss considerably and produced a negative abrasion–corrosion synergy, while imidazoline had hardly noticeable effects, especially to the binder material. The negative synergy could be related to the change in contact condition between abrasive particles and worn surface, owing to the decrease in the adsorption of benzotriazole on the worn surface as a result of cathodic protection. By lowering the corrosion rate of the binder around WC particles and thus lessening the undermining of WC particles, benzotriazole significantly improved the anti-tribocorrosion performance of the WC-based material.

Highly stable silver nanowire-based transparent conductive electrodes for electrochromic devices

Silver nanowire (AgNW)-based transparent conductive electrode (AgNW/PET) is one of the critical components in flexible optoelectronic devices. However, prolonged usage of AgNW/PETs is restrained due to their inadequate environmental stabilities. In this study, we employed a novel approach to improve the stability and conductivity of AgNWs by applying benzotriazole (BTA) and cesium-incorporated titanium dioxide (TiO2:Cs) particles onto AgNW/PET (AgNW/BTA /TiO2:Cs/PET), which formed an inhibitive complex Ag(I)–BTA and welding of nanowires through local melting at the junctions. It unveiled exemplary optoelectrical properties with a sheet resistance of 24.8 Ω/sq and transmittance of 92.9 %. Furthermore, AgNW/BTA/TiO2:Cs/PET exhibited stable electrical performances compared to the reference sample under different environmental conditions, such as in a hot-humid environment, under exposures to different lights and acidic medium. In addition, electrochromic devices fabricated using AgNW/BTA/TiO2:Cs/PET demonstrated stable electrochromic performance over 1000 cycles. Altogether the results of this study confirm that the addition of BTA and TiO2:Cs could serve as an efficient route to improve the stability and conductivity of AgNW films.

Study of the Effect of Inhibitor on the Corrosion Behavior of Steel Using Chebyshev Noise Spectroscopy and Electrochemical Impedance Spectroscopy

The electrochemical noise of a system of two identical steel electrodes in the NaCl solution without and with an addition of benzotriazole (BTA) corrosion inhibitor is measured and analyzed. It is shown that this method is a convenient tool for testing the protective properties of inhibitor. The method of impedance spectroscopy applied to this electrochemical system gives the information on the mechanism of inhibitor action.

Effects of BTA and TBAB electrolyte additives on the properties of zinc electrodes in zinc–air batteries

In order to improve the performance of zinc–air batteries, the effects of addition amounts of single Benzotriazole (BTA), Tetrabutylammonium bromide (TBAB) and their compounds on the electrochemical performance of the zinc electrodes were studied. In addition, the mechanisms of the hydrogen evolution inhibition, the dendrite suppression and the passivation improvement were investigated. The results showed that the addition of BTA, TBAB or the combination of both to the alkaline electrolyte were all beneficial for inhibiting the hydrogen evolution and corrosion, suppressing the dendrites and delaying the passivation. When BTA and TBAB were added alone, the optimal amounts were 100 mg/L and 200 mg/L, respectively. It was found that the hydrogen evolution inhibition effect of BTA was better than that of TBAB, while the effect of TBAB on suppressing the zinc dendrite was better than BTA. When BTA and TBAB were added together, the optimal amount was 100 mg/L BTA + 50 mg/L TBAB. Under this condition, the hydrogen evolution and corrosion inhibition efficiency was increased from 48.5 to 61.4% when 100 mg/L BTA was added alone. The specific capacity of the zinc–air battery after 50th cycles was increased from 327.3 mAh/g without additives to 475.6 mAh/g, and the capacity retention rate after 50 cycles reached 83.2%.

Formulation of slurry for chemical mechanical polishing of Cu substrates

The present study focuses on polishing of the Copper (Cu) metal by exploring various oxidizers in the presence of fumed silica slurry. Screening of oxidizers was done in order to get a desired polish rate for copper metal at two extreme pH regimes. Slurry is formulated to find robust polish rate for Cu Chemical Mechanical Planarization (CMP). The removal rate was investigated by using ammonium peroxydisulphate, potassium persulphate and potassium hydrogen phthalate in fumed silica slurry. Potassium persulphate showed highest material removal rate (RR) among all oxidizers at pH 9. For polishing Cu, alkaline slurry is always preferred due to the accumulation of passive layer on surface, which restricts direct dissolution of metal ions, which is prevalent in acidic region. Cu polishing done after addition of fumed silica abrasive in potassium persulphate solution at all pH values enhanced polishing rate due to the added mechanical abrasion to the chemical action. Addition of benzotriazole (BTA) as corrosion inhibitor to the slurry decreased polishing rate for complete pH range, attributed to the deposition of insoluble Cu compounds on the Cu metal surface. With increase in pressure and turntable speed an increase in removal rate was observed signifying that the proposed slurry follows non-Prestonian behaviour.

Investigation of AISI 316 Stainless Steel Corrosion in Perchloric Acid

The corrosion rate of AISI 316 SS in 1 M perchloric acid with the addition of benzotriazole as a corrosion inhibitor was investigated. It was shown that benzotriazole is a cathodic inhibitor, i.e. slows down the cathodic depolarization reaction. The inhibition efficiency reaches about 40% with an inhibitor concentration of about 10-2 M.

Ternary copolymerization strategy reducing the cost of benzodithiophene–benzodithiophenedione polymer, retaining high photovoltaic performance

AbstractThe photovoltaic performance of organic solar cells has been rapidly improved. However, in actual production and application, there are still many challenges for organic photovoltaic devices, and one of the important strategies for facilitating industrialization is reducing the cost of materials. The benzodithiophene (BDT)–benzodithiophenedione (BDD) binary copolymer donor material has good photovoltaic performance. However, the high cost of BDD monomer limits its industrialization. In contrast, lower‐cost benzotriazole (BTA) monomers have an enormous potential to solve this problem. Therefore, this paper reports the synthesis of ternary copolymers by adding BTA units into BDT–BDD copolymer with two different acceptor units. It is found that such a strategy can effectively reduce the cost of BDT–BDD polymer, and increasing the content of BTA units in the polymer to reduce the content of expensive BDD units can still retain the excellent photovoltaic properties of the BDT–BDD polymer. When only 20 mol% of BDD units remained, the bulk heterojunction structure with the synthesized donor polymer and acceptor ITIC can achieve an open circuit voltage of 0.913 V with a short circuit current of 16.87 mA cm−2 and 9.12% maximum photoelectric conversion efficiency, and the material is much cheaper than BDT–BDD polymer, in terms of structural units. Therefore, the results show that the addition of BTA can effectively reduce the material cost (versus BDD only) while retaining the good photovoltaic properties of the material, and has a certain guiding effect on the commercialization of organic solar cells. © 2020 Society of Chemical Industry

Influence of Benzotriazole and Cerium Chloride on Anticorrosion Performance of Cu-0.25Se-0.25Te Alloy in 3.5 wt% NaCl Solution

The effect of the addition of benzotriazole (BTA) or cerium chloride separately and in combination on the anticorrosion performance of Cu-Se-Te alloy in 3.5 wt% NaCl solution has been investigated. The results show that the addition of either BTA or cerium chloride significantly reduces the corrosion rate of Cu-0.25Se-0.25Te, but BTA exhibits a better inhibition effect. Meanwhile, scanning electron microscope analysis displays that the separate addition of BTA or cerium chloride makes the depth of corrosion pit of the sample decrease and the corroded surface smooth. With the combination of BTA and cerium chloride rising, the surface of the sample becomes much flatter and no obvious corrosion pit is found. Energy dispersive spectrum and x-ray photoelectron spectroscopy analyses suggest that when BTA and cerium chloride are added together, CeO2, Ce(OH)3, or complex formed by Ce and BTA might deposit on the surface of copper alloy, which induces the passivation film on the surface of the alloy to become denser and enhances the binding strength of the interface between the surface film and the matrix, thus improving the corrosion inhibition performance of the complex system.

Tailored alumina coatings for corrosion inhibition considering the synergism between phosphate ions and benzotriazole

This work looked into the synergism between sodium phosphate (SP) and benzotriazole (BT) on the morphology and the corrosion properties of Al–Mg–Si alloy processed via plasma electrolytic oxidation (PEO). To achieve this goal, the fabrication of the coatings was performed at a current density of 100 mA/cm2 for 180 s using alkaline-silicate electrolytes with SP and BT as additives. The addition of SP and/or BT to the electrolyte would lead to change the diameter of the micropores, where a nearly defect-free coating was obtained in the coating processed from electrolyte with SP and BT. Based on the experimental results, it was confirmed that SP and BT additives have some kind of synergism, which can make the coating more compact and effectively improved the corrosion properties of the aluminum alloy substrate.

Preparation of Ce-MOF@TEOS to enhance the anti-corrosion properties of epoxy coatings

A nano-structured hybrid compound was fabricated with excellent corrosion inhibitor encapsulating capacity and the ability of controlled delivery of benzotriazole (BTA) for simultaneous enhancement of the hydrophobic property and corrosion resistance of epoxy coatings. The Ce-metal organic frameworks (Ce-MOF) were synthesized and served as nanocontainers, tetraethyl orthosilicate (TEOS) was further added to form a film to wrap Ce-metal organic frameworks. The addition of benzotriazole into nanocontainers endowed coating system with excellent anti-corrosion performance. The novelty lies in that the tetraethyl orthosilicate membrane would break and produce pores to release benzotriazole uniformly under acid condition, which was a pH-controlled self-healing process through polymer coatings providing an effective release of corrosion inhibitor. The fabricated hybrid compounds were comprehensively characterized with Fourier Transform infrared spectroscopy (FTIR), Ultraviolet–visible spectroscopy (UV-vis), X-ray diffraction (XRD) and scanning electron microscopy (SEM). Electrochemical Impedance Spectroscopy (EIS) was performed to characterize the corrosion behavior of various composite coatings. Results indicated that the 3 wt.%Ce-metal organic frameworks incorporated into the epoxy coatings showed the most excellent anti-corrosion property.

Influence of slurry components on copper CMP performance in alkaline slurry

In this work, we have designed copper chemical mechanical planarization (CMP) experiments to investigate the effect of slurry components on the planarization performance of copper wafer in the presence of two different surfactants including ammonium dodecyl sulfate (ADS) and fatty alcohol polyoxyethylene ether (AEO). Copper CMP was performed at pH10.5 using hydrogen peroxide (H2O2), silica, benzotriazole (BTA), and FA/O II (a unique alkaline macromolecular organic chelating agent with high activation energy) as an oxidizer, an abrasive, a corrosion inhibitor and a complexing agent, respectively. As hydrogen peroxide is added in the copper slurry, the material removal rate (MRR) increases rapidly and then decreases slowly as a function of the concentration of H2O2. The within-wafer non-uniformity (WIWNU) declines and the surface roughness decreases first and then ascends with the increase of the H2O2 concentration. The addition of BTA has a large effect on the MRR, WIWNU and copper surface roughness. The MRR decreases to approach a minimum as a function of the BTA concentration. While the copper surface WIWNU fluctuates and the surface roughness increases with increasing the amount of BTA. As FA/O II is chosen to be a complexing agent, the MRR increases prominently and the WIWNU decreases with the increase of the FA/O II concentration. The surface roughness also decreases indicating that the addition of FA/O II can effectively improve the surface planarization performance in the present copper CMP experiments. The mechanism of the corresponding experimental results is also elucidated and discussed. All the results show that the copper surface planarization performance could be strictly controlled by proper configuration of the slurry components and an optimal choice of the concentrations of the constituents can obtain a high removal rate, low WIWNU and small surface roughness of the copper wafer in alkaline slurries.

Sodium hypochlorite as an oxidizing agent in silica based ruthenium chemical mechanical planarization slurry

In the present work, Ru as well as Cu chemical mechanical planarization (CMP) with slurry containing fumed silica as abrasive and sodium hypochlorite as oxidizer was investigated. Benzotriazole (BTA) was used as a corrosion inhibitor for the proposed slurry. The results reveal that for CMP runs with only sodium hypochlorite, Ru RR was found to be higher at pH7 and decreases as the pH decreases or increases, while Cu RR decreases with the increase in pH. Addition of BTA to the slurry resulted in a slight decrease in the removal rate. The polishing selectivity between Cu and Ru was found to be ~1 at pH9, which is desired for the microelectronic industries. RuO4 is formed in the acidic pH whereas RuO4− and RuO42− were formed between pH7 and 14 in the presence of sodium hypochlorite. RuO4/RuO4− species assist in forming RuO3/RuO2 which is porous in nature and maintains the removal rate. Polishing selectivity obtained using the proposed slurry was found to be less sensitive to any changes in pressure and table speed.

Benzotriazole as an electrolyte additive on lithium-ion batteries performance

Abstract Liquid electrolyte consisting of 1 M LiPF 6 in ethylene carbonate (EC)/dimethyl carbonate (DMC) and 0.1 wt% benzotriazole (BzTz) is studied in LiCoO 2 //graphite battery system at room temperature. Benzotriazole addition introduces excellent electrochemical stability (5.6 V vs Li) and good ionic conductivity properties at room temperature. Also, this electrolyte shows good cycling performance and better discharge capacities at high C-rates relative to the pristine electrolyte. Furthermore, the additive allows the formation of a good solid electrolyte interphase (SEI) per cyclic voltammetry (CV) examination. These specialized properties make this liquid electrolyte ideal for high power and high voltage applications.