Lanthanum cobalt oxide (LCO) has garnered growing interest in electronic switch applications based on its unique insulator to metal transition. A single-step high temperature deposition process was developed for thin film LCO via reactive dc magnetron sputtering, starting with exploration of target poisoning within the context of Berg's theory. By tracking target voltage on metal targets during reactive deposition, we reason that increasing inert gas flux to the target improves target hysteresis, thus increasing target lifetime. Furthermore, it is shown that the onset of the critical region of oxide deposition has a stronger dependence on reactive gas flow than on partial pressure and is found at approximately 1.5 sccm and 5 sccm oxygen flow rate for the La and Co targets, respectively. We subsequently probed substrate and stoichiometry influence on LCO film quality and electronic properties. Epitaxial (100) LaCoOx (Rq = 0.41 nm) films grown on lanthanum aluminate (LaAlO3) demonstrate similar reductions in resistivity over 300 K–623 K as polycrystalline LCO films on 4H–SiC and sapphire (Rq = 1.59, 2.36 nm respectively). However, La-heavy films, grown as La2.6CoO4.8, can demonstrate significantly steeper resistivity drops. Finally, we estimate the band gap collapse and insulator-metal transition of thin-film LCO over temperature by near-IR absorption.
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