A theoretical determination of magnetic-field effects on the Van der Waals interaction of a neutral atom with a semiconductor surface plasma is reported here. The magnetic field is taken to be perpendicular to the surface, and the semiconductor plasma is taken to be semi-infinite in extent. A local description of the dynamics of the magnetoplasma is employed, and nonlocal structure of plasma response is neglected. The Van der Waals interaction energy is evaluated in second-order perturbation theory to dipole terms, and the effects of a background dielectric constant are included. Our calculational procedure reflects the central role played by the concept of a dynamic plasma image of the neutral adatom in the semiconductor surface. The incorporation of magnetic-field effects, which is carried out here, involves a careful accounting of the anisotropic polarizability of the magnetoplasma in modifying the dynamic plasma image. The explicit evaluation of Van der Waals interaction energy presented here shows that the plasma part of this interaction energy is significantly changed by the magnetic field in semiconductors at field strengths for which the cyclotron frequency is comparable with the plasma frequency. The detailed magnetic-field dependence of the interaction energy obtained here should be subject to experimental confirmation using the highly precise and accurate time-of-flight diffusion method for measuring atom-surface binding energy.
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