Photon stimulated ion desorption (PSID) and NEXAFS studies have been performed on thiophene-based polymers at the Brazilian Synchrotron Light Source following sulphur K-shell photoexcitation. For poly(thiophene) (PT) and poly(3-methylthiophene) (P3MT) it was found that the S 1 s → π *, σ * (S–C) excitation produces S + desorption efficiently. On the other hand, S 2+ desorption is enhanced at higher energy excitations. These results are interpreted in terms of the Auger-stimulated ion desorption mechanism. For poly(3-hexylthiophene) (P3HT) S + desorption seems to be suppressed, which may be due to the hexyl side-chains. Desorption ion yield curves for molecular fragments reproduce the photoabsorption spectrum, being dominated by the indirect process.