Nanoscale asperity-on-asperity sliding experiments were conducted using a nanoindentation apparatus inside a transmission electron microscope, allowing for atomic-scale resolution of contact formation, sliding, and adhesive separation of two silicon nanoasperities in real time. The formation and separation of the contacts without sliding revealed adhesion forces often below detectable limits (ca. 5 nN) or at most equal to values expected from van der Waals forces. Lateral sliding during contact by distances ranging from 3.7 μm down to as little as 20 nm resulted in an average 19× increase in the adhesive pull-off force, with increases as large as 32× seen. Adhesion after sliding increased with both the sliding speed and the applied normal contact stress. Unlike cold welding, where irreversible material changes like flow occur, these effects were repeatable and reversible multiple times, for multiple pairs of asperities. We hypothesize that sliding removes passivating surface terminal species, most likely hydrogen or hydroxyl groups, making sites available to form strong covalent bonds across the interface that increase adhesion. Upon separation, repassivation occurs within the experimentally limited lower bound time frame of 5 s, with full recovery of low adhesion. The results demonstrate the strong sliding history-dependence of adhesion, which hinges on the interplay between tribologically induced removal of adsorbed species and repassivation of unsaturated bonds on freshly separated surfaces by dissociative chemisorption.
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