Atomic beam experiments are reported in which atomic oxygen, produced in a conventional microwave discharge beam source, struck Kapton samples at a translational energy of approximately 0.14 eV. After being exposed to an atomic oxygen fluence in excess of 2xl0 cm~, the Kapton samples showed no evidence of reaction, either to the naked eye or under microscopic examination. These experiments, and others performed in this laboratory and elsewhere, strongly support the notion that there is a true dynamic barrier (in incident translational energy) of between 0.2 and 1 eV for the etching of polyimide films by atomic oxygen.
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