Using (methylcyclopentadienyl)trimethylplatinum and oxygen as precursors, has been deposited by atomic layer deposition (ALD) on the surfaces of yttria-stabilized zirconia (YSZ), a solid oxide electrolyte, as well as on oxide-covered silicon. Ex situ analyses have been carried out to examine the properties of both as-deposited and postannealed films. X-ray photoelectron spectroscopy measurements demonstrate that there are no detectable impurities in the as-deposited films, and four-point probe measurements show that the resistivity for a film is as low as . The use of area-selective ALD to deposit patterned has also been investigated. By coating these same substrates with octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs), ALD can be successfully blocked. Furthermore, it is shown that by transferring the ODTS SAMs to the substrates by microcontact printing using patterned stamps, platinum thin films are grown selectively on the SAM-free surface regions. Features with sizes as small as have been deposited by this combined method; the resolution is limited by the printed pattern and, likely, can be achieved at dimensions significantly smaller than a micrometer.