Aqueous Corrosion Behavior Of Zirconium Research Articles

Irradiation simulation of zirconium using high energy argon implantation

In order to simulate the irradiation damage, the argon ion was implanted in the zirconium with fluence ranging from 1×10 16 to 1×10 17 ions/cm 2, using accelerating implanter at an extraction voltage of 190 kV at liquid nitrogen temperature. Then the effect of argon ion implantation on the aqueous corrosion behavior of zirconium was studied. The valence states of elements in the surface layer of the samples were analyzed by X-ray photoelectron spectroscopy (XPS). Glancing angle X-ray diffraction (GAXRD) was employed to examine the phase transformation due to the argon ion implantation. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted zirconium in a 1 M H 2SO 4 solution. From XPS, there existed adsorbed carbon and a little of oxygen (depth less than 20 nm) in the surface of samples, zirconium changed from zirconia to metallic zirconium along the depth direction. From GAXRD, the argon-implanted samples are little oxidized. It was found that the corrosion resistance of implanted samples declined with increasing the fluence, which is attributed to the removing of oxide protection layer and the irradiation damage.

Influence of titanium ions implantation on corrosion behavior of zirconium in 1 M H 2SO 4

In order to study the effect of titanium ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted with titanium ions with fluence ranging from 1 × 10 16 to 1 × 10 17 ions/cm 2, using a metal vapor vacuum arc (MEVVA) source at an extraction voltage of 40 kV. The valence states and depth distributions of elements in the surface layer of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), respectively. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted zirconium in a 1 M H 2SO 4 solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zirconium implanted with titanium ions. The larger the fluence, the better is the corrosion resistance of implanted sample. Finally, the mechanism of the corrosion behavior of titanium-implanted zirconium was discussed.

Influence of aluminum ions implanted on corrosion behavior of zirconium in 1 M H2SO4

In order to study the effect of aluminum ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted with aluminum ions with fluence ranging from 1×1016 to 1×1017 ions/cm2, using a metal vapor vacuum arc source (MEVVA) at an extraction voltage of 40 kV. The valence states and depth distributions of elements in the surface layer of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and auger electron spectroscopy (AES), respectively. Transmission electron microscopy (TEM) was used to examine the microstructure of the aluminum-implanted samples. Glancing angle X-ray diffraction (GAXRD) was employed to examine the phase transformation due to the aluminum ion implantation. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted zirconium in a 1 M H2SO4 solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zirconium implanted with aluminum ions. Finally, the mechanism of the corrosion behavior of aluminum-implanted zirconium was discussed.

Influence of molybdenum ion implantation on the aqueous corrosion behavior of zirconium

In order to study the effect of molybdenum ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted by molybdenum ions in the fluence range 1 × 10 16 to 5 × 10 17 ions cm –2 at maximum 160 °C, and at an extracted voltage of 40 kV. The valence of the surface layer was analyzed by X-ray photoemission spectroscopy. Three-sweep potentiodynamic polarization measurements were employed to value the aqueous corrosion resistance of zirconium in a 1N H 2SO 4 solution. Scanning electron microscopy (SEM) was performed for the three-sweep potentiodynamic polarized samples. It was found that the aqueous corrosion resistance of zirconium implanted with molybdenum declined with raising fluence. The greater is the implantation fluence, the bigger is the decline. And the natural corrosion potential of the implanted zirconium became more positive than that of the as-received zirconium. Finally, the mechanism of the corrosion resistance decline of the molybdenum-implanted zirconium is discussed.

Corrosion behavior of tin ions implanted zirconium in 1N H 2SO 4

In order to study the effect of tin ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted with tin ions to a fluence ranging from 1 × 10 20 to 5 × 10 21 ions/m 2, using a metal vapor vacuum arc source (MEVVA) at an extraction voltage of 40 kV. The valence states and depth distributions of elements in the surface layer were analyzed by X-ray photoelectron spectroscopy (XPS) and auger electron spectroscopy (AES) respectively. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to examine the micro-morphology and microstructure of tin-implanted samples. When the fluence was greater than 1 × 10 20 ions/m 2, many small tin balls were produced in the implanted surface. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted zirconium in a 1N H 2SO 4 solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zirconium implanted with 1 × 10 20 ions/m 2. When the fluence is higher than 1 × 10 20 ions/m 2, the corrosion resistance of zirconium implanted with tin ions decreased compared with that of the non-implanted zirconium. Finally, the mechanism of the corrosion behavior of the tin-implanted zirconium is discussed.

Comparison of corrosion behavior of zirconium bombarded with self-ion and molybdenum ion

In order to study the effects of zirconium and molybdenum ion bombardment on the aqueous corrosion behavior of zirconium, one group of specimens was implanted with zirconium ions with ions surface densities ranging from 1 × 10 15 to 2 × 10 17 ions/cm 2 at about 170 °C, using a metal vapor vacuum arc (MEVVA) source operated at an extraction voltage of 50 kV. The other group of specimens was bombarded with molybdenum ion with ions surface densities ranging from 1 × 10 16 to 5 × 10 17 ions/cm 2 at about 160 °C, using a MEVVA source operated at an extraction voltage of 40 kV. The valence states and depth distribution of elements in the surface of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), respectively. Polarization curves measurement was employed to evaluate the aqueous corrosion resistance of the zirconium samples in a 1N H 2SO 4 solution. It was found that the aqueous corrosion resistance of zirconium implanted with 5 × 10 16 Zr ions/cm 2 is the best in first group samples. For molybdenum ion implantation, the aqueous corrosion resistance of samples declined with raising ions surface densities. The natural corrosion potentials of zirconium samples bombarded with self-ions are more negative than that of the as-received zirconium. While, as for molybdenum ion implantation, the results are opposite. Finally, the mechanisms of the corrosion behavior of the zirconium samples implanted with zirconium and molybdenum ions are discussed.

Comparison of corrosion behavior of zirconium bombarded with self-ion and molybdenum ion

In order to study the effects of zirconium and molybdenum ion bombardment on the aqueous corrosion behavior of zirconium, one group of specimens was implanted with zirconium ions with ions surface densities ranging from 1 × 10 15 to 2 × 10 17 ions/cm 2 at about 170 °C, using a metal vapor vacuum arc (MEVVA) source operated at an extraction voltage of 50 kV. The other group of specimens was bombarded with molybdenum ion with ions surface densities ranging from 1 × 10 16 to 5 × 10 17 ions/cm 2 at about 160 °C, using a MEVVA source operated at an extraction voltage of 40 kV. The valence states and depth distribution of elements in the surface of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), respectively. Polarization curves measurement was employed to evaluate the aqueous corrosion resistance of the zirconium samples in a 1N H 2 SO 4 solution. It was found that the aqueous corrosion resistance of zirconium implanted with 5 × 10 16 Zr ions/cm 2 is the best in first group samples. For molybdenum ion implantation , the aqueous corrosion resistance of samples declined with raising ions surface densities. The natural corrosion potentials of zirconium samples bombarded with self-ions are more negative than that of the as-received zirconium. While, as for molybdenum ion implantation, the results are opposite. Finally, the mechanisms of the corrosion behavior of the zirconium samples implanted with zirconium and molybdenum ions are discussed.

Role of chromium ion implantation on the corrosion behavior of zirconium in 1N H 2SO 4

In order to study the effect of chromium ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted by chromium ions with a dose range from 1×10 16 to 1×10 17 ions/ cm 2 , using MEVVA source at an extracted voltage of 40 kV. The valence and elements penetration distribution of the surface layer were analyzed by X-ray photoelectron spectroscopy (XPS) and auger electron spectroscopy (AES), respectively. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to examine the micro-morphology and microstructure of chromium-implanted samples. The potentiodynamic polarization measurement was employed to value the aqueous corrosion resistance of zirconium in a 1N H 2SO 4 solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zirconium compared with that of as-received zirconium. The mechanism of the corrosion resistance improvement of chromium-implanted zirconium is probably due to the addition of the chromium oxide dispersoid into the zirconium matrix.

Aqueous corrosion behavior of zirconium subjected to high-energy krypton-ion bombardment

In order to study the influences of high-energy krypton ions bombardment on the aqueous corrosion behavior of zirconium, specimens were implanted by krypton ions with a dose range from 1×1015 to 3×1016ions/cm2 at about 40°C, using implanter at an extracted voltage of 300kV. The valence of the surface layer was analyzed by X-ray photoemission spectroscopy (XPS); the thickness of the oxide film was measured by Auger Electron Spectroscopy (AES). TEM was employed to examine the change of morphology and structure. The potentiodynamic polarization measurement was employed to value the aqueous corrosion resistance of zirconium in a 1N H2SO4 solution. It was found that the corrosion resistance of samples irradiated by Kr ions declined compared with as-received zirconium. The bigger the doses the worse the corrosion resistance. Finally, the mechanism of the corrosion behavior of the Kr ions bombarded zirconium is discussed.

Studies on the corrosion behavior of cerium-implanted zirconium

In order to study the influence of cerium ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted with cerium ions with a fluence ranging from 1 × 10 20 to 1 × 10 21 ions/m 2 at about 150 °C, using a MEVVA source at an extracted voltage of 40 kV. The valence and element penetration distribution of the surface layer were analyzed by X-ray photoelectron spectroscopy (XPS) and auger electron spectroscopy (AES) respectively. The potentiodynamic polarization technique was employed to investigate the aqueous corrosion resistance of zirconium in a 1N H 2SO 4 solution. It was found that there was a remarkable improvement in the aqueous corrosion behavior of zirconium implanted with cerium ions compared with that of the as-received zirconium. The corrosion resistance improvement of the cerium-implanted zirconium is probably due to the addition of cerium oxide dispersoid into the zirconium matrix and oxidization protection.

Effect of self-ion bombardment on the corrosion behavior of zirconium

In order to study the influences of self-ion bombardment on the aqueous corrosion behavior of zirconium, specimens were implanted by zirconium ions with a fluence range from 1 × 10 15 to 2 × 10 17 ions/cm 2 at about 170 °C, using MEVVA source at an extracted voltage of 50 kV. The valence of the surface layer was analyzed by X-ray photoemission spectroscopy (XPS); the thickness of the oxide film was measured by Auger electron spectroscopy (AES). Three-sweep potentiodynamic polarization measurement was employed to value the aqueous corrosion resistance of zirconium in a 1N H 2SO 4 solution. Glancing angle X-ray diffraction (GAXRD) was employed to examine the phase transformation due to the self-ion implantation in the oxide films. It was found that the aqueous corrosion behavior of zirconium implanted with 5 × 10 16 Zr ions/cm 2 is the best in all the samples. The natural corrosion potentials of all the bombarded samples are more negative than that of the as-received zirconium. The tendency is probably that the natural corrosion potential declines with raising the bombarded fluences. Finally, the mechanism of the corrosion behavior of the self-ion implanted zirconium is discussed.

Comparison of aqueous corrosion behavior of zirconium and zircaloy-4 implanted with molybdenum

In order to study the effect of molybdenum ion implantation on the aqueous corrosion behavior of zirconium and zircaloy-4, specimens were implanted by molybdenum ions with a dose range from 1 × 10 16 to 5 × 10 17 ions/cm 2 at maximum 160 °C, using MEVVA source at an extracted voltage of 40 kV. Auger electron spectroscopy and X-ray photoemission spectroscopy were employed to investigate the distribution and the valence of oxygen, zirconium and molybdenum ions inside the oxide films before and after implantation. Three-sweep potentiodynamic polarization measurement was employed to value the aqueous corrosion resistance of zirconium in a 1 N H 2SO 4 solution. Scanning electron microscopy was performed for the three-sweep potentiodynamic polarized samples. It was found that the aqueous corrosion resistance of zirconium implanted with molybdenum declined with the raising dose. The greater is the implantation dose, the bigger is the decline. And the natural corrosion potential of the implanted zirconium became more positive than as-received zirconium. While as for zircaloy-4, the corrosion resistance of samples implanted molybdenum ions will increase when the doses are less than 5 × 10 16 ions/cm 2. Finally, the mechanisms of the corrosion behavior of the molybdenum-implanted zirconium and zircaloy-4 are discussed.

Influence of lanthanum ion implantation on the aqueous corrosion behavior of zirconium

In order to investigate the effect of lanthanum ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted with lanthanum ions at a dose ranging from 1×10 16 to 1×10 17 ions/cm 2 at maximum 130 °C, using a metal vapor vacuum arc (MEVVA) source at an extracted voltage of 40 kV. The valence of the surface layer was analyzed by X-ray photoemission spectroscopy (XPS). Three-sweep potentiodynamic polarization measurement was employed to determine the aqueous corrosion resistance of zirconium in a 1 N H 2SO 4 solution. It was found that a significant improvement was achieved in the aqueous corrosion behavior of zirconium implanted with lanthanum ions compared with that of the as-received zirconium. Finally, the mechanism of improvement in the corrosion resistance of the lanthanum-implanted zirconium is discussed.