Chromium oxide (CrOX) and iron oxide (FeOX) films have been grown onto various substrates using pulsed laser deposition. CrOX films grown onto Si and LaAlO3 substrates at 390 °C with a laser beam of 450 mJ/pulse at 20 Hz are found to exhibit a (200) peak in the x-ray diffraction spectra corresponding to the rutile structure of CrO2. X-ray and scanning electron microscopy data indicate that the films are polycrystalline with an average grain size of 20 nm. Films grown at higher laser energies show the (006) peak of the antiferromagnetic Cr2O3 phase, and no strong x-ray peaks were observed from the films made at lower laser energies or lower growth temperatures. FeOX films deposited in vacuum at 400 °C with a laser beam of 500 mJ/pulse at 25 Hz are in the ferrimagnetic γ-Fe2O3 phase with a saturation magnetization of 371 kA/m, while the films deposited with O2 gas consist of the antiferromagnetic α-Fe2O3 phase. The γ-Fe2O3 phase is retained on Si substrates even at film thicknesses of 520 nm.