Although elemental fluorine has been known for more than 100 years, it is still produced by Moissan's original method, electrolysis of anhydrous HF/alkali fluoride solutions. Only one convenient alternative route for preparing fluorine has been reported to date. Several oxide and oxyfluoride semiconductors have valence band edges that are positive of the F/sup -/, F/sub 2/ standard potential, and holes photogenerated in the valence band of these materials should, in principle, be capable of oxidizing F/sup -/ to F/sub 2/. In aqueous fluoride-containing solutions other processes such as water oxidation and photoanodic corrosion compete effectively with F/sup -/ oxidation, and no fluorine is formed. Even in nonaqueous solutions these wide bandgap semiconductors photocorrode, unless sufficient reductant is present to compete for photogenerated holes. In anhydrous solutions containing sufficient quantities of fluoride ion is reasonable to expect that fluorine might be generated photoelectrochemically at a semiconductor surface which is somehow stabilized against photocorrosion. They report here that elemental fluorine is evolved at n-type TiO/sub 2/ electrodes in anhydrous HF/NaF solutions. Using bandgap illumination (365 nm) gaseous F/sub 2/ is produced with a sizable photovoltage and high power conversion and current efficiencies. While electrode photocorrosion occurs to some extent in all thesemore » experiments, it may be minimized greatly by using fluorine-doped TiO/sub 2/ electrodes.« less