Top Of Anode Research Articles

Discovery of Third Possible Ion Generating Source in 4π Plasma Focus Device Space.

Discovery of a possible third source of ion generation in 4π Plasma Focus Device (PFD) space is reported. Unexpected observation of dense ion tracks, called "On Shadow Ion Tracks" (OSIT), on the "ion cathode shadows" (ICS) was discovered. These ions were formed on panorama mega-size cylindrical polycarbonate ion image detectors placed behind the cathodes in the PFD space on PFD wall, where no ion tracks are expected to exist. Such unexpected ion tracks were observed when different gases were used, in particular hydrogen, deuterium, and helium. An ICS is formed on the detector when each cathode shadows and removes all ions bombarding it from the "anode top" and "anode cathodes assembly." Such ion tracks forming the OSITs seem to be generated not from the "anode top" and "a node cathodes assembly" but also from a third possible ion source in PFD space bombarding the detector.

A New Application of Sohrabi Albedo Neutron Dosimeters around a Plasma Focus Device.

A new application of the Sohrabi albedo neutron dosimeters is reported for the first time for determination of very low-level neutron ambient dose equivalents on and around a 3.5 kJ plasma focus device (PFD). The Sohrabi dosimeters basically use a polycarbonate track detector as bare and/or in contact with B convertor(s) under special cadmium cover arrangements. Its sensitivity was improved by using enriched B under new cadmium arrangements in order to detect epithermal neutrons in addition to fast and thermal neutrons. Results of 12 dosimeters installed externally around the PFD at different azimuthal (φ) and polar (θ) angles showed that azimuthal (φ) fast, epithermal, thermal, and total neutron ambient dose equivalents were symmetric and isotropic, respectively, with values 55.15 ± 8.36, 1.36 ± 02, 0.53 ± 03, and 57.04 ± 8.62 μSv/shot at ~25 cm from anode top. Polar (θ) neutron ambient dose equivalent values on z-axis relative to 90 angle were relatively higher. Results of 38 dosimeters placed on PFD facility walls for workplace monitoring and on a BOMAB phantom at operator's location for personal dose equivalent determination showed values below minimum detection limits after exposure to 130 PFD shots. However, an operator's personal dose equivalents at ~1.0 and ~3.0 m from the anode top were estimated to be, respectively, ~13.7 and ~1.52 mSv y using azimuthal angle (φ) values if the PFD operates, for example, up to 20 shots per day for 200 d y. Even under such an extreme assumption, annual personal dose equivalent is still much below 20 mSv, the annual ICRP dose limit for workers.

Hydrogen ion emission studies in 4π plasma focus device space

Plasma focus devices (PFD) produce copious flux of ions in particular hydrogen ions in 4π space. To achieve dense plasma pinch and then the emission of hydrogen ions at a voltage of 13 kV, experiments have been carried out at various gas pressures inside the chamber. Discharge current signals were recorded by Rogowski coil to choose only discharges with a high degree of current sheath symmetry and plasma pinch formation. Wide-angle 3D images of hydrogen ion emissions were efficiently formed for the first time in our laboratory on novel position-sensitive panorama mega-size cylindrical polycarbonate image detectors (MS-CPID) processed in self-invented panorama mega-size single-cell electrochemical etching (MS-ECE) systems. Hydrogen ion emission images are simply observed and analyzed by the unaided eyes. Near 4π wide-angle hydrogen ion image detection, iso-fluence contours, fluence on polar angle distributions, and hydrogen ion energy estimation were studied. MS-CPID/MS-ECE methods are breakthrough ion image detection art and technology for hydrogen ion plasma mechanism studies with provision of 4π position-sensitive data matrix bank. Studies confirm 4π hydrogen ion emission from “anode top” and radial ion run-aways from “anode assembly” forming “hydrogen cathode shadows” on MS-CPIDs making 4π PFD space availability evident for full-scope large-scale advanced hydrogen ion mechanism studies and applications.

Deposition of molybdenum nitride thin layers on substrates of stainless steel AISI304 using a Mather-type of plasma focus device

This study focuses on effects of number of shots and the distance from the top of anode on Mo–N deposition process on the surfaces of AISI304 samples using a low energy (2.8 kJ) plasma focus device (AECS PF-1) at room temperature. The structural, morphological, elemental composition, surface roughness and micro-hardness properties of treated surfaces were investigated versus the number of shots and the axial distance from the anode. The obtained XRD spectra show that some of the treated surfaces were in crystalline phase with [Formula: see text]-Mo2N (FCC) structure (at 3 cm with 10–40 shots and at 5 cm with 30 and 40 shots) and some others had amorphous structure at 5 cm with 10 and 20 shots and at 7 cm with 10–40 shots. SEM images indicate that the thermal effect occurred at 3 cm and the deposition process of Mo–N at 5 cm and 7 cm from the anode with an increase in number of shots. The atomic ratio for nitrogen was 10.62%, 12.88%, and for molybdenum it was 0.23%, 3.36% at 3 cm, respectively. The atomic ratio for nitrogen has achieved 14.95% and 22.17%, however, the atomic ratio for molybdenum was 2.11% and 7.17 % at 5 cm, respectively. The surface roughness and size of grains on the surface of deposited layers were investigated by AFM analysis. Furthermore, the variation in the micro-hardness of the Mo–N thin layers deposited by different number of shots at different distances from the tip of anode was explained, qualitatively, on the basis of morphological characteristics of the thin layers. The decreasing rates of hardness in the case of 10 shots were 146%, 117% and 112%, and at 40 shots were 237%, 149% and 141% with the increasing of distances 3, 5 and 7 cm, respectively.

Zinc Oxide Nanostructures Fabricated under Extremely Non-Equilibrium Plasma Conditions

In the present work, extremely non-equilibrium, high temperature and high density argon plasma is used for producing ions from pellet of zinc oxide (ZnO) fitted on top of anode. These ions along with energetic argon ions move vertically upward in a fountain like structure in post focus phase of plasma dynamics and material ions get deposited on the glass substrates placed at 4.0 cm from anode top. This process of production of material ions from ZnO pellet leads to nucleation and nanostructures formation with one and two bursts of focused plasma. The surface morphology studied using scanning electron microscopy shows the formation of nanostructures with mean size about 8 nm. The structural properties of nanostructures in X-ray diffraction pattern show [100] and [002] planes of hexagonal ZnO. Photoluminescence studies show peaks related to defect transitions. The band-gap of nanostructures found from Tauc plot is smaller than that of the bulk ZnO. The resultant morphological, structural and optical properties of nanostructures suggest the possible applications in visible optoelectronic devices.

Breakthroughs in 4π panorama ionology in plasma focus devices for mechanisms understanding with special regards to hydrogen ions (protons)

This paper reports breakthroughs on 4π panorama ion emission mechanisms understanding in a plasma focus device (PFD) in particular hydrogen ion (proton) images detected for the first time in panorama mega-size polycarbonate ion image detectors (MS-PCIDs). The MS-PCIDs were processed in novel panorama single-cell mega-size electrochemical etching (MS-ECE) image detection systems by 50 Hz - HV method. A circular and a rectangular MS-PCIDs form a “mega-size cylindrical ion detector” capable to efficiently detect 4π proton emission with “Proton Cathode Shadow” or any other phenomena on ionographs or images, observable by the unaided eyes with potential for relative “dynamic proton spectrometry”. The effects of 6 circular MC-PCID distances from a flat-end cone anode top, anode top geometry, and type of gas on ion emissions in particular protons are presented and discussed. The potential of near 4π availability of PFD space highly enhances efficient PFD applications, what has been limited by narrow beam emission exercises within small solid angle on or around z-axis.

Effects of fusion relevant transient energetic radiation, plasma and thermal load on PLANSEE double forged tungsten samples in a low-energy plasma focus device

Tungsten is the leading candidate for plasma facing component (PFC) material for thermonuclear fusion reactors and various efforts are ongoing to evaluate its performance or response to intense fusion relevant radiation, plasma and thermal loads. This paper investigates the effects of hot dense decaying pinch plasma, highly energetic deuterium ions and fusion neutrons generated in a low-energy (3.0 kJ) plasma focus device on the structure, morphology and hardness of the PLANSEE double forged tungsten (W) samples surfaces. The tungsten samples were provided by Forschungszentrum Juelich (FZJ), Germany via International Atomic Energy Agency, Vienna, Austria. Tungsten samples were irradiated using different number of plasma focus (PF) shots (1, 5 and 10) at a fixed axial distance of 5 cm from the anode top and also at various distances from the top of the anode (5, 7, 9 and 11 cm) using fixed number (5) of plasma focus shots. The virgin tungsten sample had bcc structure (α-W phase). After PF irradiation, the XRD analysis showed (i) the presence of low intensity new diffraction peak corresponding to β-W phase at (211) crystalline plane indicating the partial structural phase transition in some of the samples, (ii) partial amorphization, and (iii) vacancy defects formation and compressive stress in irradiated tungsten samples. Field emission scanning electron microscopy showed the distinctive changes to non-uniform surface with nanometer sized particles and particle agglomerates along with large surface cracks at higher number of irradiation shots. X-ray photoelectron spectroscopy analysis demonstrated the reduction in relative tungsten oxide content and the increase in metallic tungsten after irradiation. Hardness of irradiated samples initially increased for one shot exposure due to reduction in tungsten oxide phase, but then decreased with increasing number of shots due to increasing concentration of defects. It is demonstrated that the plasma focus device provides appropriate intense fusion relevant pulses for testing the structural, morphological and mechanical changes on irradiated tungsten samples.

Effects of anode geometry on forward wide-angle neon ion emissions in 3.5 kJ plasma focus device by novel mega-size panorama polycarbonate image detectors

Forward wide-angle neon ion emissions in a 3.5 kJ plasma focus device (PFD) were studied using 5 different anode top geometries; hollow-end cylinder, solid triangle, solid hemisphere, hollow-end cone and flat-end cone. Position-sensitive mega-size panorama polycarbonate ion image detectors (MS-PCID) developed by dual-cell circular mega-size electrochemical etching (MS-ECE) systems were applied for processesing wide-angle neon ion images on MS-PCIDs exposed on the PFD cylinder top base under a single pinch shot. The images can be simply observed, analyzed and relatively quantified in terms of ion emission angular distributions even by the unaided eyes. By analysis of the forward neon ion emission images, the ion emission yields, ion emission angular distributions, iso-fluence ion contours and solid angles of ion emissions in 4π PFD space were determined. The neon ion emission yields on the PFD cylinder top base are in an increasing order ~2.1×109, ~2.2 ×109, ~2.8×109, ~2.9×109, and ~3.5×109 neon ions/shot for the 5 stated anode top geometries respectively. The panorama neon ion images as diagnosed even by the unaided eyes demonstrate the lowest and highest ion yields from the hollow-end cylinder and flat-end cone anode tops respectively. Relative dynamic qualitative neon ion spectrometry was made by the unaided eyes demonstrating relative neon ion energy as they appear. The study also demonstrates the unique power of the MS-PCID/MS-ECE imaging system as an advanced state-of-the-art ion imaging method for wide-angle dynamic parametric studies in PFD space and other ion study applications.

Damage Study of Irradiated Tungsten using fast focus mode of a 2.2 kJ plasma focus

In this work, damage results of four 12 mm × 12 mm × 5 mm PLANSEE double forged tungsten target samples exposed in INTI PF device at different distances from anode operating in the fast focus mode at 12 kV, 2.5 Torr deuterium are presented. SEM and EDX images and analysis show the extent of damage on the exposed tungsten surface. Micro-cracks up to 300 nm and 500 nm to 5 μm holes together with signs of melting are found on the tungsten exposed surfaces depending on their distances from the anode top. Current waveforms fitting using Lee Model Code show yields of 3 × 106 neutrons and 8.5 × 1014 ions per shot with average ion energy of 56 keV per ion at pinch exit, generating heat flux of 1.8 × 1014 Wm−2 and damage factor (also called heat flux factor) of 1.6 × 1010 Wm−2s0.5 on a target at pinch exit.

Ion acceleration mechanism in plasma focus devices

AbstractPlasma focus is one type of ion source with energy up to few MeV. While some efforts have been made to understand the physics of ion beam acceleration in plasma focus devices (PFD), an acceptable clarification does not exist yet. In this work, the procedure of ions) electrons) acceleration in PFDs to the MeV energy is investigated theoretically. Moreover, the trajectory of electrons (ions) and their angular distribution are studied. The simulations are carried out by COMSOL Multiphysics version 5.2 for a 4.5 kJ Mather type PFD. The results of simulations and calculations show that trapped ions in the negative potential of electrons, their movement toward the top of the anode and the drift motion due to electrical and magnetic fields near the top of the anode are the main causes of high energy electrons (ions) production and acceleration.

Breakthrough in 4π ion emission mechanism understanding in plasma focus devices.

Ion emission angular distribution mechanisms in plasma focus devices (PFD) have not yet been well developed and understood being due to the lack of an efficient wide-angle ion distribution image detection system to characterize a PFD space in detail. Present belief is that the acceleration of ions points from “anode top” upwards in forward direction within a small solid angle. A breakthrough is reported in this study, by mega-size position-sensitive polycarbonate ion image detection systems invented, on discovery of 4π ion emission from the “anode top” in a PFD space after plasma pinch instability and radial run-away of ions from the “anode cathodes array” during axial acceleration of plasma sheaths before the radial phase. These two ion emission source mechanisms behave respectively as a “Point Ion Source” and a “Line Ion Source” forming “Ion Cathode Shadows” on mega-size detectors. We believe that the inventions and discoveries made here will open new horizons for advanced ion emission studies towards better mechanisms understanding and in particular will promote efficient applications of PFDs in medicine, science and technology.

Structural, compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

The hydrogenated amorphous carbon nitride (a‐CNx:H) thin films were synthesized on the SS‐304 substrates using a dense plasma focus device. The a‐CNx:H thin films were synthesized using CH4/N2 admixture gas and 20 focus deposition shots on substrates placed at different distances from the anode top. X‐ray photoelectron spectroscopy and Raman analysis confirmed different C–N bonding in the a‐CNx:H thin films. A decrease in the N/C ratio as well as the sp3/sp2 ratio with an increase in the substrate distance has been observed. The higher amount of C–N formation for the film synthesized at 10 cm is observed which decreases with increasing distance. The X‐ray photoelectron spectroscopy and Raman analysis affirmed the C ≡ N presence in all the thin films synthesized at different distances. The morphology of the synthesized a‐CNx:H thin films showed nanoparticles and nanoparticle clusters formation at the surface. The hardness results showed comparatively lower hardness of the a‐CNx:H thin films due to the presence of C ≡ N. The C–N formation with lower amount of C ≡ N and a higher N/C ratio as well as a higher sp3/sp2 ratio for the films synthesized at 10 cm show reasonably higher hardness. Copyright © 2016 John Wiley & Sons, Ltd.

Correlation of Local Conductivity to Microstructure for Li-Ion Battery Electrodes By Use of a Contact Probe and SEM/FIB

Electron transport in lithium-ion battery structures is a key factor in overall battery performance, but the cause of localized high and low electron transport values, or conductivity, has not been well-studied or understood. Factors that may affect such heterogeneity include high-level variables such as film composition and porosity, as well as manufacturing steps such as film drying and calendering [2]. Here we report on our efforts to correlate battery film structure to measured conductivity values, to better understand the causes of observed film heterogeneity. A modified micro 4-line probe [1] was installed in a high resolution stage with a microscope attached for localization on a µm scale. Using the associated theory, electrical conductivity of commercially manufactured battery films was mapped. Subsequently, particularly “hot” or “cold” conductivity locations were additionally investigated by scanning electron microscope (SEM) combined with focused ion beam (FIB) milling to produce planar cross sections.SEM/FIB images are segmented into 3 domains: carbon, active material, and pores. Each image is characterized using key metrics. These key metrics are then compared to mapped conductivity values in order to determine possible causes of high and low conductivity. This contributes to the goal of this work, namely to increase the uniformity of electrodes by improved control of the manufacturing process. Figure 1: Measured electrical resistivity of commercial anode (top) with SEM/FIB cross section of region with high conductivity (bottom).

Characterization of x-rays pulses from a hundred joules plasma focus to study its effects on cancer cells.

With the purpose to study the effects of pulsed x-rays radiation on cancer cells, the total doses of x-ray pulses and the temporal duration of the pulse has been characterized in a hundred joules plasma focus device (PF-400J, 130 kA achieved in 300ns, 30 kV, 880 nF, 38 nH). TLD dosimeters were located outside of the discharge chamber, at 96 mm from the anode top. In addition, two photomultipliers with plastic scintillator were located in axial and radial directions. From the statistical analysis of the TLD and photomultiplier signals, was possible to estimate that a single shot has a total dose of the order of 30±15 µSv with a duration of the order of 12±3.6 ns at FWHM. Preliminary experiments using MCF7, a breast cancer cell line, were performed. Cells were irradiated at 96 mm from the anode top with 300 cumulative x-ray shots and cell proliferation was evaluated at 24, 48 and 72 hours later.

Deuterium Plasma Focus as a Tool for Testing Materials of Plasma Facing Walls in Thermonuclear Fusion Reactors

This paper presents the first verification of the fast ion beam (FIB) and fast plasma stream (FPS) properties computed using the Lee code. Recent estimates of FIB and FPS properties in PF-400J from interferometric images are compared to our computed results. Reasonable agreement is found in the comparison of several quantities. Our computed power flow density (energy flux) and integral damage factor are 2.45 × 1012 Wm−2 (2 times of experimental value) and 1.78 × 108 Wm−2 s0.5 (~almost the same as experimental value) respectively, for target placed at 1.5 cm from the anode top of PF-400J. This verification gives us confidence to proceed to systematic numerical calculations on the PF-400J and similar small plasma focus devices (PF50, NX2, NX3, FMPF-3, INTI PF) to obtain FIB properties (ion beam energy, ion beam flux, ion beam fluence, beam ion number, ion beam current, power flow density, and damage factor). These results confirm that the plasma focus, including small ones, could be useful to study the effects of cumulative pulses on target materials being considered for plasma facing walls in future tokamak or laser-implosion fusion reactors.

Dense Plasma Focus Device Based High Growth Rate Room Temperature Synthesis of Nanostructured Zinc Oxide Thin Films

High-energy-density plasmas in plasma focus device are now routinely being used as nonconventional plasma nanotechnology tool with novel processing and deposition parameters which are not available in conventional lowtemperature plasma facilities. This paper reports the synthesis of multilayered polycrystalline intrinsic defects-free nanostructured zinc oxide (ZnO) thin film onto room-temperature silicon substrates at high growth rates using pulsed high-energy-density dense plasma focus device. The device was operated in pure oxygen environment and the ablation target used was a pure zinc rod fitted onto the anode top. Thin films of ZnO were deposited at room temperature using different numbers of dense plasma focus shots and at different distances from the anode top. The as-deposited ZnO showed the formation of polycrystalline hexagonal phase ZnO thin films with strong c-axis orientation. The scanning electron microscopy results showed either uniformly laid nanoparticles or cauliflower aggregates of nanoparticles on the surface of the thin-film samples with average nanoparticle size varying between 23.3 ± 6.1 and 69.7 ± 16.5 nm. The average thicknesses of the multilayered thin films were measured to be in a range of 1.06 ± 0.14 to about 2.82 ± 0.32 μm. The complete disappearance of deep level emission band in photoluminescence spectrum of ZnO thin-film sample deposited using 30 focus shots at deposition distance of 15 cm showed successful synthesis of high crystalline quality intrinsic defects-free as-deposited ZnO thin film. One of the key features of the ZnO thin-film synthesis using nonconventional plasma focus device is the very high average growth rate of about 0.1 μm/shot. At one plasma focus shot per minute operation, the average growth rate comes out to be 0.1 μm/min, which is either higher or comparable with commonly used ZnO deposition methods; but at 10 Hz operation extreme growth rates of about 60 μm/min could be achieved.

Surface Plasmon Properties of Silver Nanostructures Fabricated Using Extremely Non-Equilibrium, Hot and Dense Plasma

We present fabrication of silver nanostructures on glass substrates using highly energetic and high fluence material ions generated by one shot of hot, dense and extremely non-equilibrium plasma such as found in modified dense plasma focus (DPF) device. The substrates were first placed at 4.0 cm and 6.0 cm from the top of anode. Nanodots and nanocapsules are observed in the scanning electron microscopy (SEM) images of silver ions deposited with DPF shot on glass. The interparticle distance is found to decrease whereas mean size of nanodots is found to increase slightly when the distance of glass substrate is increased from 4.0 cm to 6.0 cm. The X-ray diffraction (XRD) pattern of the fabricated nanostructures has peaks at 2θ equals 37.90o, 44.24o and 64.20o which correspond to (111), (200) and (220) planes of silver having face-centered cubic structure. The nanostructures obtained on glass placed at 4.0 cm show surface plasmon resonance (SPR) peak at 420 nm whereas nanostructures obtained on glass placed at 6.0 cm has a SPR peak at 428 nm. Redshift of the SPR peak is attributed to increased interaction as a result of decrease in interparticle distance of the nanostructures as well as increase in mean size of nanodots.

AFM, XRD and Optical Studies of Silver Nanostructures Fabricated under Extreme Plasma Conditions

This paper reports the deposition of silver on silicon and glass substrates using ions generated in a 3.3 KJ dense plasma focus device. The hot and dense argon plasma formed during the focus phase ionizes the silver disc placed above the top of the anode. Glass and silicon substrates are placed at an axial position of 4.0 cm and 5.0 cm from the top of the anode and are exposed by two focus shots. The deposited materials obtained were characterized using X-ray diffraction, Atomic Force Microscopy (AFM) and UV-vis Spectroscopy. The X-ray diffraction shows the [111] and [200] reflections of silver deposited on silicon substrates whereas on glass only [111] plane is observed. The AFM of silver deposited on silicon substrates shows nanostructures which have triangular like shape. The UV spectra for silver nanostructures placed at 4.0 cm and 5.0 cm on glass substrate shows the absorption peak which originates from the surface plasmon absorption of nanosized silver particles. A red shift of ~13 nm is observed for silver deposited on glass substrate placed at the distance of 5.0 cm from the top of anode.

High-Energy-Density Pinch Plasma: A Unique Nonconventional Tool for Plasma Nanotechnology

Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">13</sup> m <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> at the lower end to as high as 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">23</sup> m <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> have firmly established themselves as one of the most efficient and versatile tools to create and process materials at nanoscale. The dense plasma focus (DPF) device, which is a noncylindrical <i xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">Z</i> -pinch facility that compresses the plasma to very high energy densities, offers a complex mix of high energy ions of the filling gas species, immensely hot and dense decaying plasma, fast-moving ionization wave front, and a strong shockwave that provides a unique plasma and a physical/chemical environment that is completely unheard of in any other conventional plasma-based deposition or processing facility. This review aims to highlight the novel features offered by pulsed high-energy-density pinch plasmas from a DPF, having temperatures and densities a few orders of magnitudes higher than conventional low-temperature plasmas, in the processing and the synthesis of materials at nanoscale. The nanoscale fabrication using the DPF device is elaborated and discussed in two broad categories: 1) top-down nanoscale fabrication by processing of bulk or thin-film target materials that are placed downstream the anode axis by the energetic transient flux of energetic ions, the hot decaying plasma, the fast ionization wave front, and the shock front; and 2) bottom-up nanoscale fabrication by deposition of nanostructured thin films of metals and/or their nitrides, carbides, and oxides by ablating the metal fitted on to the anode top under suitable reactive or inert background plasma.

Investigation of Spatial Distribution of Hydrogen and Argon Ions and Effects of them on Aluminum Samples in a 2.5 kJ Mater Type Plasma Focus Device

In this work the effects of Hydrogen and Argon ions on Aluminum samples and the spatial distribution of the ions in 2.5 kJ SBUPF1 Mather type plasma focus device in different distance from the anode top have been investigated. For each gas the pressure and operation voltage have been determined to have maximum ion density. Aluminum samples were placed at different distances above the anode. Irradiated samples have been analyzed with SEM technique for morphological and surface study of samples. Melting and surface evaporation effects and generation of cracks were seen in these samples. The result of ions patterns on these samples can be used to determine ions spatial distribution on top of the anode region. The EDX spectroscopy and the SRIM calculations have been done to determine the composition of samples and the penetration depth of the ions in the samples respectively.