Vapor phase infiltration (VPI) is a bottom-up process that involves the infiltration of polymers, often using atomic layer deposition compatible precursors. By exposing a polymer to an organo-metallic precursor, area selective material formation is achieved where the precursor reacts with regions covered by an infiltration-receptive polymer brush. Combining receptive and rejecting polymers that have the capability of forming complex nanopatterns could potentially allow for the creation of nanofeatures, offering a route to area selective deposition. This work is concerned with the creation and characterization of titanium-infiltrated films with a VPI process. Thin films of poly(methyl methacrylate) (PMMA) were infused with titanium isopropoxide and subsequently analyzed with angular resolved x-ray photoelectron spectroscopy. All XPS analysis and VPI treatments were completed without breaking vacuum in an integrated ultrahigh vacuum setup, with O 1s, C 1s, Ti 2p, and Si 2p core levels revealing the successful incorporation of titanium into the polymer. Grazing angle Fourier-transform infrared spectroscopy demonstrates the breaking of carbon–oxygen double bonds within the PMMA structure due to titanium incorporation.
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