Direct oxidation of trimethylsilyl ethers to their corresponding carbonyl compounds has drawn considerable attention in recent years. However, some of the reported methods suffer from disadvantages such as long reaction time, low yields of the products and tedious work-up procedure. Therefore, introduction of new methods for such functional group transformation is still in demand. Recently, we have reported that (NH4)2Cr2O7 in the presence of Al(HSO4)3 and wet SiO2 can be used as an efficient reagent for the oxidation of alcohols to their corresponding carbonyl compounds. In continuation of this study, we were interested in extending the applicability of this reagent system to the oxidation of the other functional groups. In this paper, we report a new, efficient and selective method for the oxidative deprotection of trimethylsilyl ethers to their corresponding carbonyl compounds using the above mentioned reagent system in solution and under a solvent free condition. Oxidative deprotection of different types of trimethylsilyl ethers was investigated in the absence of solvent with ammonium dichromate in the presence of Al(HSO4)3 and wet SiO2 at room temperature (Scheme 1). Yields and reaction times are given in Table 1. Benzylic trimethylsilyl ethers, including electron donating and withdrawing groups are converted to their corresponding carbonyl compounds in high yields (Table 1). Trimethylsilyl ethers containing alkyl ethereal groups are converted to their corresponding aldehydes and ketones without cleavage of carbon-oxygen bond (Table 1, entries 9, 10). This method is also very effective for the oxidation of non-benzylic trimethylsilyl ethers (Table 1, entries 13-16). Over-oxidation of the products was not observed by this method. In order to compare the results obtained under a solvent free condition with those obtained in solution, we studied the oxidation reaction in n-hexane. As shown in Table 1, in most cases, there are appreciable differences between the results obtained in solution and those under a solvent free condition. By omitting the solvent, the reaction time was reduced in addition to ease of the work-up procedure. It should be noted that the oxidation did not proceed using any of Al(HSO4)3, ammonium dichromate or wet SiO2 alone, which presumably suggested the in situ generation of H2CrO4 in low concentration at the surface of wet SiO2 by the solid inorganic acid salts Al(HSO4)3 and (NH4)2Cr2O7. Tetrahydropyranyl ethers do not undergo oxidative deprotection by this method. Therefore, in order to show the selectivity of the described method, we have also performed competitive oxidative deprotection reactions. The experimental results show that trimethylsilyl ethers are oxidized selectively in the presence of tetrahydropyranyl ethers (Scheme 2). These selectivities are useful achievements in organic synthesis. In conclusion, we have introduced a mild, efficient and selective method for the selective oxidative deprotection of trimethylsilyl ethers using ammonium dichromate in the presence of Al(HSO4)3 and wet SiO2 in solution and under a solvent free condition.