A corrosion mechanism is proposed for Al 3Mg 2, based on electrochemical tests, XPS, and depth profiling using XPS and ToF-SIMS. After short (∼2 min) solution exposure, the surface consists of a surface film above dealloying. The dealloying is attributed to selective Mg dissolution and the surface rearrangement of Al into islands, although the metallic Al could alternatively be formed by two reduction reactions. The surface film thickness was ∼10 nm. After exposure to ultra-pure water, the composition was AlMg 1.3O 0.2(OH) 5.1 corresponding to Al(OH) 3·1.1 Mg(OH) 2·0.2MgO. After exposure to 0.01 M Na 2SO 4, the composition was AlMg 0.2O 0.4(OH) 2.5 corresponding to Al(OH) 3·0.1Al 2O 3·0.2MgO. Longer exposure produced a thicker surface film, more pronounced metallic Al islands and more MgH 2. Three possibilities are identified for MgH 2 formation. Al(OH) 3 formation is attributed to a precipitation reaction. Bulk nanoporous Al 3Mg 2 formation is predicted to be possible by Mg dealloying of Mg 17Al 12.