In this work a facile two-step process, comprising of e-beam evaporated precursor deposition of (In/Cu/Ag/Se)× 3 multi-stack over substrate followed by additional selenization treatment, has been used to grow high-quality Cu0.5Ag0.5InSe2 (CAISe) films. The post selenization was performed at distinct temperatures in the range, 300 °C - 500 °C, and the effect of selenization temperature on the growth of CAISe thin films was reported in detail. The post selenization of (In/Cu/Ag/Se)×3 precursors at temperatures < 450 °C showed multiple spurious phases of Cu2Se, In2Se3, Ag2Se, and In6Se7 alongside CAISe. For selenization temperatures ≥ 450 °C, the films are purely polycrystalline, single-phase, and exhibiting tetragonal crystal structure with preferred (112) orientation belongs to CAISe. Further, Raman phase analysis for the precursors selenized at ≥ 450 °C displays intense phonon modes at 67 cm−1(B2), 171 cm−1 (A1), and 212 cm-1 (B2/E1) corresponding to single phase tetragonal CAISe. The compositional analysis of (In/Cu/Ag/Se)× 3 precursors selenized at 475°C indicated that the films are nearly stoichiometric with an average atomic composition of Cu+Ag = 25.69, In = 24.39, and Se = 49.92 in at. %. The elemental depth profile across thickness shows that the distribution of elements is uniform. The micrograph of precursor stack selenized at 475 °C found to have compact and larger grains (~1.0 µm). The optical studies of stacked precursors selenized between 450 °C and 500 °C reveal a solo absorption edge, with an optical band gap ranging between 1.13 eV and 1.05 eV. The stacked layers selenized at 475 °C exhibits higher hole mobility of 27.0 cm2/V-s, and a moderate concentration of 1.26 × 1016 cm−3.