Grooved silicon structures formed by anisotropic chemical etching of crystalline silicon (c-Si) wafers in alkaline solution and composed by c-Si walls and voids (grooves) with thicknesses of several micrometers were found to exhibit efficient photoluminescence after excitation with laser radiation at 1.06 μm. The photoluminescence emission which originates from the interband radiative recombination of charge carriers in c-Si walls was represented by a broad spectral band centered at 1.1 eV. Independently on the polarization direction of the excitation light the photoluminescence of grooved silicon structures was partially linear-polarized with the polarization degree of 0.15–0.24 along c-Si walls and the photoluminescence intensity was strongly enhanced in comparison with that of c-Si substrate. These experimental observations are explained by considering an enhancement of the photoluminescence excitation due to both partial light localization in c-Si walls and a low rate of the non-radiative recombination at surface defects on c-Si walls. The defect density could be modified by additional chemical treatment or thermal annealing, which resulted in significant changes of the photoluminescence intensity of the grooved Si structures. The obtained results are discussed in view of possible applications of grooved Si in optoelectronics and molecular sensorics.
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