A comprehensive analysis on the electrical transport phenomena prevailing in undoped nc-Si/a-SiNx:H thin films prepared by inductively coupled plasma chemical vapor deposition and its correlation with the specific inhomogeneous structure, consisting of a mixture of different phases involving charge transfer by tunneling and thermionic emission or a connected network of aggregates of such components, has been made for deeper understanding in order to facilitate and improve the device applicability of the material. The nc-Si/a-SiNx:H films exhibit a thermally activated electrical transport above room temperature. Multi-phonon hopping (MPH), following σ∝Ty, occurs below room temperature, involving higher number of acoustic phonons in less crystalline network at higher nitrogenation. In less nitrogenated network, the MPH conduction continues up to the lowest temperature because of less localization of charge carriers within larger size of the nanocrystallites. Mott variable range hopping (Mott-VRH), following ln(σ) ∝ T−¼, is in effect below a certain temperature for highly nitrogenated network. The nature of variations of Mott parameter, T*, hopping activation energy, Wh, optimum hopping distance, rh, and the estimated density of states at the Fermi level, N(EF), identify the increased degree of disorder in the film attributing enhanced amorphous concentration at higher nitrogenation. The transition from MPH to Mott-VRH occurring at higher temperature at relatively higher nitrogenation has been interpreted as the freezing out of the acoustic phonons associated with lower grain size with higher number density at comparatively higher temperature, considering the phonon wavelength approximately of the size of nanocrystallites. The present intrinsic nc-Si/a-SiNx:H material containing nanocrystallites of average size ∼12–2 nm and number density ∼1011–1012 cm−2 providing a significantly wide range of optical band gap, Eg ∼ 1.80–2.75 eV with associated very high electrical conductivity, σD ∼ 10−2–10−6 S cm−1 along with high carrier concentration, ne ∼ 1014–1011 cm−3 and electron mobility, μe ∼ 246–105 cm2 V−1 s−1, seems to be the superior, concerning issues related to usability in device fabrication, among typical wide optical gap silicon dielectric materials available in the literature, e.g., silicon carbide, silicon oxide, and amorphous silicon films with nc-Si inclusions; while being the only comprehensive report on nanocrystalline silicon nitride (nc-Si/a-SiNx:H) thin films, in particular.
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