Formation Of Acid-base Resistant Zone Research Articles

Resin Cement/Enamel Interface: A Morphological Evaluation of the Acid-Base Resistant Zone, Enamel Etching Pattern, and Effect of Thermocycling on the Microshear Bond Strength.

To evaluate the effects of etching mode (self-etch and etch-and-rinse) on acid-base resistant zone (ABRZ) formation at the resin cement/enamel interface and enamel etching pattern, as well as the effects of thermocycling (0, 5000, and 10,000 cycles) on the enamel microshear bond strength (μSBS) mediated by dual-cure resin cements (DCRC). Two DCRC were used in 4 groups: Panavia V5 in self-etch (V5NE) and etch-and-rinse mode (V5E); and Estecem II in self-etch (ENE) and etch-and-rinse mode (EE). For ABRZ observation, the bonded interface was subjected to a demineralizing solution. The morphological attributes of the interface and etching patterns were observed using FE-SEM. For μ-SBS, cylinders with a 0.79-mm internal diameter and 0.5-mm height were made with DCRC and tested in shear after 0, 5000, and 10,000 thermal cycles (TC) (5°C and 55°C) (n = 10). The formation of an enamel ABRZ was observed in all groups with different morphological features between self-etch and etch-and-rinse groups. A funnel-shaped erosion beneath the interface was present using V5NE and ENE modes where enamel was dissolved, while ABRZ formation was confirmed and no funnel-shaped erosion was noticed using V5E and EE. No significant differences in μSBS were observed between resin cements. However, significantly lower µSBSs were recorded when the self-etching mode was used. Thermocycling resulted in a significant reduction in µSBS for all groups. Selective enamel etching should be recommended to improve the interfacial quality when dual-cure resin luting cements are used.

Can a New HEMA-free Two-step Self-etch Adhesive Improve Dentin Bonding Durability and Marginal Adaptation?

A new two-step self-etch adhesive (2-SEA) free of hydrophilic monomers was evaluated. Its microtensile bond strength (µTBS) to dentin under various aging conditions, interfacial gap formation, water sorption/solubility, and formation of an acid-base resistant zone (ABRZ) were evaluated and compared with a gold-standard 2-SEA. The new 2-SEA G2-Bond Universal (G2; GC) was compared to Clearfil SE Bond 2 (CSE2, Kuraray Noritake). Their µTBS to sound coronal dentin was tested after 1 week, 10,000 thermal cycles (TC), 20,000 TC, 6 months and 1 year. Failure mode was determined using scanning electron microscopy (SEM). Gap formation at the interface of 2-mm deep tapered cavities with an enamel border was observed using swept-source optical coherence tomography after 1 day, 1 week, 10,000 TC, and 20,000 TC. In addition, water sorption and solubility of the bonding agents was measured, and ABRZ formation was evaluated using SEM. There was no significant difference in µTBS between G2 and CSE2 (p > 0.05), and the aging conditions had no significant effect on µTBS (p > 0.05). In all groups, cohesive failures prevailed (55%-95%). Interfacial gap formation was initially similar for both adhesives (p > 0.05), but G2 exhibited a significantly lower gap formation than CSE2 after TC (p < 0.05). The water sorption of G2 was significantly lower compared to CSE2 (p < 0.05), and their solubility was statistically similar (p > 0.05). ABRZ of similar thickness was observed with both adhesives. The new 2-SEA exhibited stable dentin bonding and increased hydrophobicity resulting from the absence of hydrophilic monomers.

The concept of super enamel formation -Relationship between chemical interaction and enamel acid-base resistant zone at the self-etch adhesive/enamel interface.

Self-etch adhesive (SEA) systems simplify bonding procedures. It is believed that good mechanical retention and chemical bonding are both important factors to obtain reliable bonding to enamel. The enamel acid-base resistant zone (ABRZ) has been confirmed at the adhesive/enamel interface by scanning electron microscopic observation. However, the formation of enamel ABRZ is influenced by the type and components of adhesive systems. Chemical interactions by a functional monomer with hydroxyapatite strongly support the explanation of the mechanism for enamel ABRZ formation. The ABRZ created by MDP-containing SEA systems has shown good potential to resist acid attack from simulated recurrent caries models. In addition, fluoride release may enhance acid resistance. It has been proposed that such a reinforced enamel be termed "Super Enamel". The concept of the formation of super enamel may contribute to protecting enamel, and conserve tooth structure leading to improved restoration longevity.

Adhesion durability of dual-cure resin cements and acid–base resistant zone formation on human dentin

ObjectivesBond durability and resistance to acid-base challenge of dentin with dual-cure resin cement have been rarely investigated. The purpose of this study was to evaluate dentin bond strength and observe the adhesive-dentin interface after acid-base challenge using three different dual-cure resin cements. MethodsThirty dentin surfaces from caries-free human premolars were ground and bonded with one of three dual-cure resin cements: PANAVIA V5 (V5), ESTECEM II (E II) and Rely X Ultimate (RXU) and thermocycled for 0, 5,000 and 10,000 cycles. A microtensile bond strength (μTBS) test was undertaken and the interface of the bonded specimens after acid-base challenge was examined by SEM. ResultsThe μTBS of V5 exhibited a stable bond strength despite thermal cycling while the bond of EII and RXU after 10,000 cycles dropped significantly among all thermal cycle periods (p<0.05). An acid-base resistant zone (ABRZ) was observed in all groups, however, the morphology of the bonded interface differed among the tested cements. ConclusionBonding durability to dentin and ABRZ morphologies differed among the cements evaluated. PANAVIA V5 cement system with tooth primer provided the most reliable bond strength and was best able to resist the acid–base challenge.

Effects of Different Tooth Conditioners on the Bonding of Universal Self-etching Adhesive to Dentin.

To investigate the effect of different etching products used prior to the application of universal self-etching adhesive on dentin bonding. The etching products Multi Etchant (ME), Enamel Conditioner (EC), and K-etchant GEL (KE) were used as pre-treatments prior to the application of the one-bottle self-etching adhesive Adhese Universal (AU). Ground human dentin surfaces were randomly divided into four treatment groups: 1. control (CT; AU without con-ditioner); 2. ME; 3. EC; 4. KE. Microtensile bond strength (µTBS) tests with a thermocycling challenge (0-TC or 10,000-TC) were carried out and the morphological attributes of the adhesive-dentin interface were observed after an acid-base challenge using SEM to observe the acid-base resistant zone (ABRZ). The KE group had a statistically significantly lower µTBS than did the ME and EC groups at 0-TC, and than the CT, ME, and EC groups at 10,000-TC (p < 0.05). An ABRZ was observed in all groups but had partially disappeared in KE. A funnel-shaped area of erosion was also observed at the junction of the dentin and bonding layer in the CT, ME, and EC groups, while the hybrid layer was thicker in the KE group with no evidence of erosion. The application of ME or EC did not reduce the microtensile bond strength and resulted in ABRZ formation, while the ABRZ was partially reduced in the KE group.

Influence of orthodontic self-etch adhesive on acid resistance of surface enamel.

The purpose of this study was to investigate the formation of acid-base resistant zone (ABRZ) of enamel surface during bracket bonding by using three self-etch adhesives presently available in the orthodontic treatment. Also, the relation between the thickness of the ABRZ and bonding strength, the relation between the thickness of the ABRZ and the concentration of fluoride ions contained in the adhesives, were discussed respectively. The ABRZ was formed with all self-etch orthodontic adhesives. ABRZ thicknesses of two self-etch adhesives were approximately 0.8-1.0 μm, whereas ABRZ thickness of other one was about 0.1 μm. The bond strengths of all self-etch orthodontic adhesives indicated over 10 MPa, and ABRZ thickness observed in the enamel surface seemed to have no influence to the bond strengths among self-etch adhesives. Moreover, the thickness of ABRZ appeared to be associated with the amount of fluoride ion released from the primer.

Effects of Selective Phosphoric Acid Etching on Enamel Using "No-wait" Self-etching Adhesives.

To evaluate the effect of selective phosphoric acid etching on enamel using "no-wait" self-etching adhesives. Clearfil Universal Bond Quick (UBQ, Kuraray Noritake) or G-Premio BOND (GPB, GC) was applied to ground human enamel surfaces. The adhesives were used in 3 modes: no-waiting self-etching mode (UBQ-0 or GPB-0), 10-s self-etching mode (UBQ-10 or GPB-10), and the selective-etch mode with phosphoric acid etching (UBQ-PA or GPB-PA). After an acid-base challenge, the morphological attributes of the interface were examined using scanning electron microscopy (SEM) to characterize the acid-base resistant zone (ABRZ). Microshear bond strength (µSBS) testing to enamel and ultimate tensile strength (UTS) of the adhesive resin were carried out. ABRZ formation was confirmed in all groups. UBQ-PA and GPB-PA created thicker ABRZ with no funnel-shaped erosion beneath the adhesive-enamel interface. µSBS of UBQ-PA was significantly higher than UBQ-0 and UBQ-10 (p < 0.05). However, there were no statistically signficant differences in µSBS among GPB-0, GPB-10, and GPB-PA. For the UTS, UBQ was significantly higher than GPB. Selective phosphoric acid etching created a stable adhesive-enamel interface. The no-waiting self-etching concept adhesive led to a thinner ABRZ. The results of µSBS suggest that phosphoric acid etching effects on enamel are material dependent.

Sodium hypochlorite effects on dentin bond strength and acid-base resistant zone formation by adhesive systems

Sodium hypochlorite effects on dentin bond strength and acid-base resistant zone formation by adhesive systems

Dentin bonding performance using Weibull statistics and evaluation of acid-base resistant zone formation of recently introduced adhesives.

Dentin bonding durability of recently introduced dental adhesives: Clearfil SE Bond 2 (SE2), Optibond XTR (XTR), and Scotchbond Universal (SBU) was investigated using Weibull analysis as well as analysis of the micromorphological features of the acid-base resistant zone (ABRZ) created for the adhesives. The bonding procedures of SBU were divided into three subgroups: self-etch (SBS), phosphoric acid (PA) etching on moist (SBM) or dry dentin (SBD). All groups were thermocycled for 0, 5,000 and 10,000 cycles followed by microtensile bond strength testing. Acid-base challenge was undertaken before SEM and TEM observations of the adhesive interface. The etch-and-rinse method with SBU (SBM and SBD) created inferior interfaces on the dentin surface which resulted in reduced bond durability. ABRZ formation was detected with the self-etch adhesive systems; SE2, XTR and SBS. In the PA etching protocols of SBM and SBD, a thick hybrid layer but no ABRZ was detected, which might affect dentin bond durability.

Sodium hypochlorite effects on dentin bond strength and acid-base resistant zone formation by adhesive systems

Aim: To evaluate the effects of 10% NaOCl gel application on the dentin bond strengths and morphology of resin-dentin interfaces formed by three adhesives. Methods: Two etch-and-rinse adhesives (One-Step Plus, Bisco Inc. and Clearfil Photo Bond, Kuraray Noritake Dental) and one self-etch adhesive (Clearfil SE Bond, Kuraray Noritake Dental) were applied on dentin according to the manufacturers’ instructions or after the treatment with 10% NaOCl (ED-Gel, Kuraray Noritake Dental) for 60 s. For interfacial analysis, specimens were subjected to acid-base challenge and observed by SEM to identify the formation of the acid-base resistant zone (ABRZ). For microtensile bond strength, the same groups were investigated and the restored teeth were thermocycled (5,000 cycles) or not before testing. Bond strength data were subjected to two-way ANOVA and Tukey’s test (p<0.05). Results: NaOCl application affected the bond strengths for One-Step Plus and Clearfil Photo Bond. Thermocycling reduced the bond strengths for Clearfil Photo Bond and Clearfil SE Bond when used after NaOCl application and One-Step Plus when used as recommended by manufacturer. ABRZ was observed adjacent to the hybrid layer for self-etch primer. The etch-and-rinse systems showed external lesions after acid-base challenge and no ABRZ formation when applied according to manufacturer’s instructions. Conclusions:10% NaOCl changed the morphology of the bonding interfaces and its use with etch-&-rinse adhesives reduced the dentin bond strength. Formation of ABRZ was material-dependent and the interface morphologies were different among the tested materials.

Self-etch adhesive systems: a literature review.

This paper presents the state of the art of self-etch adhesive systems. Four topics are shown in this review and included: the historic of this category of bonding agents, bonding mechanism, characteristics/properties and the formation of acid-base resistant zone at enamel/dentin-adhesive interfaces. Also, advantages regarding etch-and-rinse systems and classifications of self-etch adhesive systems according to the number of steps and acidity are addressed. Finally, issues like the potential durability and clinical importance are discussed. Self-etch adhesive systems are promising materials because they are easy to use, bond chemically to tooth structure and maintain the dentin hydroxyapatite, which is important for the durability of the bonding.

Dentin bonding performance and ability of four MMA-based adhesive resins to prevent demineralization along the hybrid layer.

To evaluate the tensile bond durability and ability of four MMA-based adhesive resins to prevent demineralization along the hybrid layer when exposed to a demineralizing solution. A PMMA rod was bonded to human dentin using one of four MMA-based adhesive systems: Super-Bond C&B (SB), SBP-40TX (SBP, experimental), M-Bond (MB), and M-Bond II (MB II). Bonded specimens were sectioned into 0.9 mm x 0.9 mm beams and subjected to microtensile bond strength (µTBS) testing after water storage at 37°C for 24 h or 10,000 thermal cycles. Data were analyzed with two-way ANOVA and Bonferroni's t-test. Fracture mode analysis of the bonding interface was performed using a scanning electron microscope (SEM) and statistically analysed using the chi-square test. To disclose the demineralization inhibition potential through formation of an acid-base resistant zone (ABRZ), the bonded interface was exposed to a demineralizing solution (pH 4.5) for 90 min, and then 5% NaOCl for 20 min. After argon-ion etching, the interfacial ultrastructure was observed using an SEM. µTBS values without thermocycling were not significantly different (p > 0.05) among 4 adhesive resins. After thermocycling, a significant decrease in µTBS was found in MB and MB II (p < 0.001), whereas SB and SBP showed no significant change (p > 0.05). Failure modes were significantly different (p < 0.05). An ABRZ was seen in SBP, MB, and MB II, while this protective zone was absent in SB. Dentin bonding performance after thermocycling was material dependent in MMA-based adhesive resins. The ABRZ formation was only observed in the self-etching systems.

Phosphoric Acid-Etching Promotes Bond Strength and Formation of Acid-Base Resistant Zone on Enamel

This study examined the effect of phosphoric acid (PA) etching on the bond strength and acid-base resistant zone (ABRZ) formation of a two-step self-etching adhesive (SEA) system to enamel. An etch-and-rinse adhesive (EAR) system Single Bond (SB) and a two-step SEA system Clearfil SE Bond (SE) were used. Human teeth were randomly divided into four groups according to different adhesive treatments: 1) SB; 2) SE; 3) 35% PA etching→SE primer→SE adhesive (PA/SEp+a); (4) 35% PA etching→SE adhesive (PA/SEa). Microshear bond strength to enamel was measured and then statistically analyzed using one-way analysis of variance and the Tukey honestly significant difference test. The failure mode was recorded and analyzed by χ( 2 ) test. The etching pattern of the enamel surface was observed with scanning electron microscope (SEM). The bonded interface was exposed to a demineralizing solution (pH=4.5) for 4.5 hours and then 5% sodium hypochlorite with ultrasonication for 30 minutes. After argon-ion etching, the interfacial ultrastructure was observed using SEM. The microshear bond strength to enamel of the SE group was significantly lower (p<0.05) than that of the three PA-etched groups, although the latter three were not significantly different from one another. The ABRZ was detected in all the groups. In morphological observation, the ABRZ in the three PA-etched groups were obviously thicker compared with the SE group with an irregular wave-shaped edge.

Effect of curing modes of dual-curing core systems on microtensile bond strength to dentin and formation of an acid-base resistant zone.

To evaluate the microtensile bond strength (μTBS) and acid-base resistant zone (ABRZ) of two dualcuring core systems to dentin using four curing modes. Sixty-four caries-free human molars were randomly divided into two groups according to two dual-curing resin core systems: (1) Clearfil DC Core Automix; (2) Estelite Core Quick. For each core system, four different curing modes were applied to the adhesive and core resin: (1) dual-cured and dual-cured (DD); (2) chemically cured and dual-cured (CD); (3) dual-cured and chemically cured (DC); (4) chemically cured and chemically cured (CC). The specimens were sectioned into sticks (n = 20 for each group) for the microtensile bond test. μTBS data were analyzed using two-way ANOVA and the Dunnett T3 test. Failure patterns were examined with scanning electron microscopy (SEM) to determine the proportion of each mode. Dentin sandwiches were produced and subjected to an acid-base challenge. After argon-ion etching, the ultrastructure of ABRZ was observed using SEM. For Clearfil DC Core Automix, the μTBS values in MPa were as follows: DD: 29.1 ± 5.4, CD: 21.6 ± 5.6, DC: 17.9 ± 2.8, CC: 11.5 ± 3.2. For Estelite Core Quick, they were: DD: 48.9 ±5.7, CD: 20.5 ± 4.7, DC: 41.4 ± 8.3, CC: 19.1 ± 6.0. The bond strength was affected by both material and curing mode, and the interaction of the two factors was significant (p < 0.001). Within both systems, there were significant differences among groups, and the DD group showed the highest μTBS (p < 0.05). ABRZ morphology was not affected by curing mode, but it was highly adhesive-material dependent. The curing mode of dual-curing core systems affects bond strength to dentin, but has no significant effect on the formation of ABRZ.

Effect of functional monomers in all-in-one adhesive systems on formation of enamel/dentin acid-base resistant zone

This study aimed at evaluating the effect of functional monomers in all-in-one adhesive systems on formation of acid-base resistant zone (ABRZ) in enamel and dentin. Experimental adhesive systems containing one of three functional monomers; MDP, 3D-SR and 4-META were applied to enamel or dentin surface and light-cured. A universal resin composite was then placed. The specimens were subjected to a demineralizing solution (pH 4.5) and 5% NaClO for acid-base challenge and then observed by SEM. The ABRZ was clearly observed in both enamel and dentin interfaces. However, enamel ABRZ was thinner than dentin ABRZ in all adhesives. Morphology of the ABRZ was different between enamel and dentin, and also among the adhesives. Funnel-shaped erosion was observed only in the enamel specimen with the 4-META adhesive. The formation of enamel/dentin ABRZ was confirmed in all adhesives, but the morphology was influenced by the functional monomers.

The role of functional monomers in bonding to enamel: Acid–base resistant zone and bonding performance

Objectives To investigate the effects of two functional monomers on caries-inhibition potential and bond strength of two-step self-etching adhesive systems to enamel. Methods Clearfil SE Bond and similar experimental formulations different in the functional monomer were used. Four combinations of primer and bonding agents were evaluated: (1) Clearfil SE Bond which contains MDP in both primer and bonding (M–M); (2) Clearfil SE Bond primer and Phenyl-P in bonding (M–P); (3) Phenyl-P in primer and Clearfil SE Bond bonding (P–M); (4) Phenyl-P in primer and bonding (P–P). Ground buccal enamel surfaces of human sound premolars were treated with one of the systems and the bonded interface was exposed to an artificial demineralising solution (pH 4.5) for 4.5 h, and then 5% NaOCl with ultrasonication for 30 min. After argon-ion etching, the interfacial ultrastructure was observed using SEM. Micro-shear bond strength to enamel was measured for all groups and results were analysed using one-way ANOVA and Turkey's HSD, while failure modes were analysed by chi-square test. Results An acid–base resistant zone (ABRZ) was found with all adhesive systems containing MDP either in primer or bond; however, ultramorphology and crystallite arrangement in the ABRZ were different among groups. P–P was the only group devoid of this protective zone. Micro-shear bond strength in M–M was significantly higher than those in M–P, P–M and P–P, while the latter three were not different from each other. Failure modes were significantly different ( p < 0.05). Conclusions Functional monomers in two-step self-etching systems influence both the bonding performance and the formation of ABRZ on enamel.

デュアルキュア型レジンコアシステムの重合方式が象牙質に対する微小引張接着強さとAcid-base Resistant Zoneの形成に及ぼす影響

デュアルキュア型レジンコアシステムの重合方式が象牙質に対する微小引張接着強さとAcid-base Resistant Zoneの形成に及ぼす影響